화학공학소재연구정보센터
검색결과 : 8건
No. Article
1 A fast and reliable method used to investigate the size-dependent retention lifetime of a phase-change line cell
Goux L, Hurkx GAM, Wang XP, Delhougne R, Attenborough K, Gravesteijn D, Wouters D, Gonzalez JP
Solid-State Electronics, 58(1), 17, 2011
2 Quantitative prediction of junction leakage in bulk-technology CMOS devices
Duffy R, Heringa A, Venezia VC, Loo J, Verheijen MA, Hopstaken MJP, van der Tak K, de Potter M, Hooker JC, Meunier-Beillard P, Delhougne R
Solid-State Electronics, 54(3), 243, 2010
3 Analysis of the leakage current origin in thin strain relaxed buffer substrates
Eneman G, Simoen E, Delhougne R, Verheyen P, Simons V, Loo R, Caymax M, Claeys C, Vandervorst W, De Meyer K
Journal of the Electrochemical Society, 153(5), G379, 2006
4 Progress in the physical modeling of carrier illumination
Dortu F, Clarysse T, Loo R, Pawlak B, Delhougne R, Vandervorst W
Journal of Vacuum Science & Technology B, 24(3), 1131, 2006
5 Non-selective thin SiGe strain-relaxed buffer layers: Growth and carbon-induced relaxation
Caymax M, Delhougne R, Ries M, Luysberg M, Loo R
Thin Solid Films, 508(1-2), 260, 2006
6 Development of a new type of SiGe thin strain relaxed buffer based on the incorporation of a carbon-containing layer
Delhougne R, Meunier-Beillard P, Caymax M, Loo R, Vandervorst W
Applied Surface Science, 224(1-4), 91, 2004
7 Fabrication of 50 nm high performance strained-SiGe pMOSFETs with selective epitaxial growth
Loo R, Collaert N, Verheyen P, Caymax M, Delhougne R, De Meyer K
Applied Surface Science, 224(1-4), 292, 2004
8 Selective epitaxial deposition of strained silicon: a simple and effective method for fabricating high performance MOSFET devices
Delhougne R, Eneman G, Caymax M, Loo R, Meunier-Beillard P, Verheyen P, Vandervorst W, De Meyer K, Heyns M
Solid-State Electronics, 48(8), 1307, 2004