1 |
Reactive bipolar pulsed dual magnetron sputtering of ZrN films: The effect of duty cycle Rizzo A, Valerini D, Capodieci L, Mirenghi L, Di Benedetto F, Protopapa ML Applied Surface Science, 427, 994, 2018 |
2 |
Characteristics of ITO Thin Films for the Plasma Display Panel Prepared by a MF Dual Magnetron Sputtering in the Oxygen Atmosphere Lee JH, Sohn SH, Moon JH, Park MS, Lee SG Molecular Crystals and Liquid Crystals, 499, 500, 2009 |
3 |
Investigation of Ti/TiN multilayered films in a reactive mid-frequency dual-magnetron sputtering Xiang Y, Hua M, Cheng-Biao W, Zhi-Qiang F, Yang L Applied Surface Science, 253(7), 3705, 2007 |
4 |
Physical properties of erbium implanted tungsten oxide films deposited by reactive dual magnetron sputtering Mohamed SH, Anders A Thin Solid Films, 515(13), 5264, 2007 |
5 |
Fabrication and characterization of metal and semiconductor SmS thin films by rf/dc dual magnetron sputtering Tanemura S, Koide S, Senzaki Y, Miao L, Hirai H, Mori Y, Jin P, Kaneko K, Terai A, Nabatova-Gabain N Applied Surface Science, 212, 279, 2003 |