검색결과 : 2건
| No. | Article |
|---|---|
| 1 |
Interdependence of optimum exposure dose regimes and the kinetics of resist dissolution for electron beam nanolithography of polymethylmethacrylate Mohammad MA, Fito T, Chen J, Aktary M, Stepanova M, Dew SK Journal of Vacuum Science & Technology B, 28(1), L1, 2010 |
| 2 |
Simulation of electron beam lithography of nanostructures Stepanova M, Fito T, Szabo Z, Alti K, Adeyenuwo AP, Koshelev K, Aktary M, Dew SK Journal of Vacuum Science & Technology B, 28(6), C6C48, 2010 |