화학공학소재연구정보센터
검색결과 : 3건
No. Article
1 Approach to the characterization of through-oxide boron implantation by secondary ion mass spectrometry
Jiang ZX, Backer S, Lee JJ, Wu LY, Guenther T, Sieloff D, Choi P, Foisy M, Alkemade PFA
Journal of Vacuum Science & Technology B, 19(4), 1133, 2001
2 Two-dimensional dopant profile of 0.2 mu m metal-oxide-semiconductor field effect transistors
Wang XD, Mahaffy R, Tan K, Shih CK, Lee JJ, Foisy M
Journal of Vacuum Science & Technology B, 18(1), 560, 2000
3 A conjugation-based version of the UNIFAC method
Foisy M, Takamoto D, Mavrovouniotis ML
Fluid Phase Equilibria, 137(1-2), 111, 1997