화학공학소재연구정보센터
검색결과 : 14건
No. Article
1 Superhydrophobic polymeric films with hierarchical structures produced by nanoimprint (NIL) and plasma roughening
Durret J, Szkutnik PD, Frolet N, Labau S, Gourgon C
Applied Surface Science, 445, 97, 2018
2 Formation of Submicrometer Pore Arrays by Electrochemical Etching of Silicon and Nanoimprint Lithography
Laffite G, Roumanie M, Gourgon C, Perret C, Boussey J, Kleimann P
Journal of the Electrochemical Society, 158(1), D10, 2011
3 NIL processes and material characterization on transparent substrates for optical applications
Chaix N, Gourgon C, Perret C, Decossas S, Landis S, Lambertini VG, Pira NL
Journal of Vacuum Science & Technology B, 26(6), 2174, 2008
4 Comparison of monomer and polymer resists in thermal nanoimprint lithography
Zelsmann M, Toralla K, De Girolamo J, Boutry D, Gourgon C
Journal of Vacuum Science & Technology B, 26(6), 2430, 2008
5 Nanoimprint lithography processes on 200 mm Si wafer for optical application: Residual thickness etching anisotropy
Chaix N, Gourgon C, Perret C, Landis S, Leveder T
Journal of Vacuum Science & Technology B, 25(6), 2346, 2007
6 Benchmarking of 50 nm features in thermal nanoimprint
Gourgon C, Chaix N, Schift H, Tormen M, Landis S, Torres CMS, Kristensen A, Pedersen RH, Christiansen MB, Fernandez-Cuesta I, Mendels D, Montelius L, Haatainen T
Journal of Vacuum Science & Technology B, 25(6), 2373, 2007
7 Photopolymerization kinetic study of UV nanoimprint lithography dedicated resists
Voisin P, Zelsmann M, Ridaoui H, Chouiki M, Gourgon C, Boussey J, Zahouily K
Journal of Vacuum Science & Technology B, 25(6), 2384, 2007
8 Influence of mold depth on capillary bridges in nanoimprint lithography
Chaix N, Landis S, Hermelin D, Leveder T, Perret C, Delaye V, Gourgon C
Journal of Vacuum Science & Technology B, 24(6), 3011, 2006
9 Spatial control of organic nanocrystal nucleation in sol-gel thin films for 3-D optical data storage devices or chemical multi-sensors
Botzung-Appert E, Zaccaro J, Gourgon C, Usson Y, Baldeck PL, Ibanez A
Journal of Crystal Growth, 283(3-4), 444, 2005
10 Measurement of residual thickness using scatterometry
Fuard D, Perret C, Farys V, Gourgon C, Schiavone P
Journal of Vacuum Science & Technology B, 23(6), 3069, 2005