화학공학소재연구정보센터
검색결과 : 3건
No. Article
1 Characterization of High Oxygen - Tetraethylorthosilicate Ratio Plasma-Enhanced Chemical-Vapor-Deposited Films
Decrosta DA, Hackenberg JJ, Linn JH
Journal of the Electrochemical Society, 143(3), 1079, 1996
2 Charge Issues in High Oxygen Gas Ratio Tetraethylorthosilicate Plasma-Enhanced Chemical-Vapor-Deposition Films
Decrosta DA, Hackenberg JJ
Journal of Vacuum Science & Technology A, 14(3), 709, 1996
3 Identification of Plasma-Induced Failure Modes in the Development of a Bipolar-Complementary Metal-Oxide-Semiconductor Process
Hackenberg JJ, Dion MJ, Hemmenway DF, Pearce LG, Werner JW
Journal of Vacuum Science & Technology A, 13(3), 943, 1995