검색결과 : 2건
| No. | Article |
|---|---|
| 1 |
Techniques and applications of secondary ion mass spectrometry and spreading resistance profiling to measure ultrashallow junction implants down to 0.5 keV B and BF2 Harrington WL, Magee CW, Pawlik M, Downey DF, Osburn CM, Felch SB Journal of Vacuum Science & Technology B, 16(1), 286, 1998 |
| 2 |
Surface Metal Contamination During Ion-Implantation - Comparison of Measurements by Secondary-Ion Mass-Spectroscopy, Total-Reflection X-Ray-Fluorescence Spectrometry, and Vapor-Phase Decomposition Used in Conjunction with Graphite-Furnace Atomic-Absorption Spectrometry and Inductively-Coupled Plasma-Mass Spectrometry Frost MR, Harrington WL, Downey DF, Walther SR Journal of Vacuum Science & Technology B, 14(1), 329, 1996 |