검색결과 : 2건
| No. | Article |
|---|---|
| 1 |
Damage reduction and sealing of low-k films by combined He and NH3 plasma treatment Urbanowicz AM, Baklanov MR, Heijlen J, Travaly Y, Cockburn A Electrochemical and Solid State Letters, 10(10), G76, 2007 |
| 2 |
Damage reduction and sealing of low-k films by combined He and NH3 plasma treatment (vol 10, pg G76, 2007) Urbanowicz AM, Baklanov MR, Heijlen J, Travaly Y, Cockburn A Electrochemical and Solid State Letters, 10(11), S7, 2007 |