검색결과 : 21건
| No. | Article |
|---|---|
| 1 |
Infrared Spectroscopy of CH4/N-2 and C2Hm/N-2 (m=2, 4; 6) Gas Mixtures in a Dielectric Barrier Discharge Thejaswini HC, Peglow S, Sushkov V, Hippler R Plasma Chemistry and Plasma Processing, 34(5), 1157, 2014 |
| 2 |
Ionized vapor deposition of antimicrobial Ti-Cu films with controlled copper release Stranak V, Wulff H, Ksirova P, Zietz C, Drache S, Cada M, Hubicka Z, Bader R, Tichy M, Helm CA, Hippler R Thin Solid Films, 550, 389, 2014 |
| 3 |
Degradation of various textile dyes as wastewater pollutants under dielectric barrier discharge plasma treatment Tichonovas M, Krugly E, Racys V, Hippler R, Kauneliene V, Stasiulaitiene I, Martuzevicius D Chemical Engineering Journal, 229, 9, 2013 |
| 4 |
Effects of Reactive Oxygen Species on Single Polycation Layers Berg F, Block S, Drache S, Hippler R, Helm CA Journal of Physical Chemistry B, 117(28), 8475, 2013 |
| 5 |
Role of nitrogen in optical and electrical band gaps of hydrogenated/hydrogen free carbon nitride film Majumdar A, Bogdanowicz R, Mukherjee S, Hippler R Thin Solid Films, 527, 151, 2013 |
| 6 |
Angle-resolved investigation of ion dynamics in high power impulse magnetron sputtering deposition system Cada M, Adamek P, Stranak V, Kment S, Olejnicek J, Hubicka Z, Hippler R Thin Solid Films, 549, 177, 2013 |
| 7 |
Modeling of altered layer formation during reactive ion etching of GaAs Mutzke A, Rai A, Schneider R, Angelin EJ, Hippler R Applied Surface Science, 263, 626, 2012 |
| 8 |
Ultra low-k property of hydrogenated carbon nitride: Chemical evaluation Majumdar A, Das SC, Shripathi T, Hippler R Chemical Physics Letters, 524, 62, 2012 |
| 9 |
Chemical synthesis and surface morphology of amorphous hydrogenated carbon nitride film deposited by N-2/CH4 dielectric barrier discharge plasma Majumdar A, Das SC, Shripathi T, Hippler R Composite Interfaces, 19(3-4), 161, 2012 |
| 10 |
Role of Nitrogen in the Formation of HC-N Films by CH4/N-2 Barrier Discharge Plasma: Aliphatic Tendency Majumdar A, Das G, Basvani KR, Heinicke J, Hippler R Journal of Physical Chemistry B, 113(48), 15734, 2009 |