검색결과 : 7건
| No. | Article |
|---|---|
| 1 |
Thermal stability of Al/barrier/TiSix multilayer structures Lu JP, Hsu WY, Hong QZ, Dixit GA, Luttmer JD, Havemann RH, Chen PJ, Tsai HL, Magel LK Thin Solid Films, 320(1), 20, 1998 |
| 2 |
Self-aligned Ti and Co silicides for high performance sub-0.18 mu m CMOS technologies Kittl JA, Hong QZ Thin Solid Films, 320(1), 110, 1998 |
| 3 |
Advanced salicides for 0.10 mu m CMOS : Co salicide processes with low diode leakage and Ti salicide processes with direct formation of low resistivity C54 TiSi2 Kittl JA, Hong QZ, Yang H, Yu N, Samavedam SB, Gribelyuk MA Thin Solid Films, 332(1-2), 404, 1998 |
| 4 |
Effect of Ar Sputter Etch on the Texture of Ti and Al/Tin/Ti Metal Stack Hsu WY, Hong QZ, Liu HY, Douglas M, Taylor K, Magel LK, Luttmer JD, Havemann RH Journal of the Electrochemical Society, 144(9), L248, 1997 |
| 5 |
A Novel Process for Fabricating Conformal and Stable Tin-Based Barrier Lu JP, Hsu WY, Hong QZ, Dixit GA, Luttmer JD, Havemann RH, Magel LK Journal of the Electrochemical Society, 143(12), L279, 1996 |
| 6 |
Materials Aspects of Ti and Co Silicidation of Narrow Polysilicon Lines Kittl JA, Hong QZ Thin Solid Films, 290-291, 473, 1996 |
| 7 |
Thermal-Stability of Silicide on Polycrystalline Si Hong QZ, Hong SQ, Dheurle FM, Harper JM Thin Solid Films, 253(1-2), 479, 1994 |