화학공학소재연구정보센터
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No. Article
1 [기획특집: 스포츠·레저 산업용 소재] 아웃도어용 가방제품개발 동향
지영주, 박재경, 강윤화
Korean Industrial Chemistry News, 17(6), 2, 2014
2 Characterization of residual implant damage by generation time technique
Jee YJ, Kim CY, Jun CS, Kim TS, Belyaev A, Marinskiy D
Solid-State Electronics, 82, 16, 2013
3 Dopant loss of ultrashallow junction by wet chemical cleaning
Buh GH, Park T, Yon GH, Kim SB, Jee YJ, Hong SJ, Ryoo C, Yoo JR, Lee JW, Jun CS, Shin YG, Chung UI, Moon JT
Journal of Vacuum Science & Technology B, 24(1), 499, 2006
4 Quantitative analysis of ultrashallow junction of sub-50 nm gate-length transistors: Junction depth, sheet resistance, short channel effects, and transistor performance
Buh GH, Park T, Yon GH, Hong SJ, Ryoo CW, Yoo JR, Lee JW, Jee YJ, Lee JS, Jun CS, Shin YG, Chung UI, Moon JT
Journal of Vacuum Science & Technology B, 24(1), 503, 2006
5 Photodissociation dynamics of acetyl bromide at 234 nm
Lee KW, Jee YJ, Jung KH
Journal of Chemical Physics, 116(11), 4490, 2002
6 Photodissociation of Br-2 at 234 and 265 nm: Imaging studies of one and two photon excitation
Jee YJ, Jung YJ, Jung KH
Journal of Chemical Physics, 115(21), 9739, 2001
7 Determination of reaction rates via the discharge-flow chemiluminescence imaging technique: gas-phase reactions of O(P-3) with CFClCXY (X,Y = H,F,Cl)
Yi HJ, Jee YJ, Lee KW, Jung KH
Chemical Physics Letters, 327(5-6), 325, 2000