검색결과 : 1건
No. | Article |
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1 |
Characterization and integration of new porous low-k dielectric (k < 2.3) for 65 nm technology and beyond Choi KK, Cho IH, Park SJ, Lim JE, Jung OJ, Park JH, Min BS, Hwang SB, Ko MJ, Lee JG Thin Solid Films, 515(12), 5025, 2007 |