화학공학소재연구정보센터
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No. Article
1 Preliminary-Results from a Prototype Projection Electron-Beam Stepper-Scattering with Angular Limitation Projection Electron-Beam Lithography Proof-of-Concept System
Harriott LR, Berger SD, Biddick C, Blakey MI, Bowler SW, Brady K, Camarda RM, Connelly WF, Crorken A, Custy J, Dimarco R, Farrow RC, Felker JA, Fetter L, Freeman R, Hopkins L, Huggins HA, Knurek CS, Kraus JS, Liddle JA, Mkrtychan M, Novembre AE, Peabody ML, Tarascon RG, Wade HH, Waskiewicz WK, Watson GP, Werder KS, Windt D
Journal of Vacuum Science & Technology B, 14(6), 3825, 1996
2 Lithographic Performance of a Negative Resist Under Scattering with Angular Limitation for Projection Electron Lithography Exposure at 100 keV
Tarascon RG, Bolan K, Blakey M, Camarda RM, Farrow RC, Fetter LA, Huggins HA, Kraus JS, Liddle JA, Mixon DA, Novembre AE, Watson GP, Berger SD
Journal of Vacuum Science & Technology B, 12(6), 3444, 1994
3 Marks for Alignment and Registration in Projection Electron Lithography
Farrow RC, Liddle JA, Berger SD, Huggins HA, Kraus JS, Camarda RM, Tarascon RG, Jurgensen CW, Kola RR, Fetter L
Journal of Vacuum Science & Technology B, 11(6), 2175, 1993
4 Particle-Particle Interaction Effects in Image Projection Lithography Systems
Berger SD, Eaglesham DJ, Farrow RC, Freeman RR, Kraus JS, Liddle JA
Journal of Vacuum Science & Technology B, 11(6), 2294, 1993