Previous Article Next Article Table of Contents Journal of Vacuum Science & Technology B, Vol.12, No.6, 3444-3448, 1994 DOI10.1116/1.587529 Export Citation Lithographic Performance of a Negative Resist Under Scattering with Angular Limitation for Projection Electron Lithography Exposure at 100 keV Tarascon RG, Bolan K, Blakey M, Camarda RM, Farrow RC, Fetter LA, Huggins HA, Kraus JS, Liddle JA, Mixon DA, Novembre AE, Watson GP, Berger SD Keywords:BEAM LITHOGRAPHY Please enable JavaScript to view the comments powered by Disqus.
