화학공학소재연구정보센터
검색결과 : 4건
No. Article
1 Deposition Uniformity, Particle Nucleation, and the Optimum Conditions for Chemical-Vapor-Deposition in Multiwafer Furnaces
Griffiths SK, Nilson RH
Journal of the Electrochemical Society, 144(4), 1399, 1997
2 Low-Pressure Chemical-Vapor-Deposition of Polycrystalline Silicon - Analysis of Nonuniform Growth in an Industrial-Scale Reactor
Weerts WL, Decroon MH, Marin GB
Journal of the Electrochemical Society, 144(9), 3213, 1997
3 Chemical-Vapor-Deposition of Silicon Doped in-Situ with Phosphorus .1. Experimental-Study
Tounsi A, Scheid E, Duverneuil P, Couderc JF
Canadian Journal of Chemical Engineering, 74(6), 941, 1996
4 Low-Pressure Chemical-Vapor-Deposition of Polycrystalline Silicon - Validation and Assessment of Reactor Models
Weerts WL, Decroon MH, Marin GB
Chemical Engineering Science, 51(10), 2109, 1996