| 1 |
The mechanism underlying Ler-mediated alleviation of gene repression by H-NS
Shin MS
Biochemical and Biophysical Research Communications, 483(1), 392, 2017 |
| 2 |
Scaling/LER study of Si GAA nanowire FET using 3D finite element Monte Carlo simulations
Elmessary MA, Nagy D, Aldegunde M, Seoane N, Indalecio G, Lindberg J, Dettmer W, Peric D, Garcia-Loureiro AJ, Kalna K
Solid-State Electronics, 128, 17, 2017 |
| 3 |
The effects of gas flow rates on the etch characteristics of silicon nitride with an extreme ultra-violet resist pattern in CH2F2/N-2/Ar capacitively coupled plasmas
Kwon BS, Lee JH, Lee NE
Thin Solid Films, 519(20), 6741, 2011 |
| 4 |
Comparison of line edge roughness and profile angles of chemical vapor deposited amorphous carbon etched in O-2/N-2/Ar and H-2/N-2/Ar inductively coupled plasmas
Park YR, Kwon BS, Jung CY, Heo W, Lee NE, Shon JW
Thin Solid Films, 519(20), 6755, 2011 |
| 5 |
Impact of line width roughness on the matching performances of next-generation devices
Gustin C, Leunissen LHA, Mercha A, Decoutere S, Lorusso G
Thin Solid Films, 516(11), 3690, 2008 |
| 6 |
Inhibition of transcriptional activities of AP-1 and c-Jun by a new zinc finger-protein ZNF394
Huang CX, Wang YQ, Li DL, Li YQ, Luo J, Yuan WZ, Ou Y, Zhu CB, Zhang YJ, Wang Z, Liu MY, Wu XS
Biochemical and Biophysical Research Communications, 320(4), 1298, 2004 |
