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| No. | Article |
|---|---|
| 1 |
Converging lithography by combination of electrostatic layer-by-layer self-assembly and 193 nm photolithography: Top-down meets bottom-up Hah JH, Mayya S, Hata M, Jang YK, Kim HW, Ryoo M, Woo SG, Cho HK, Moon JT Journal of Vacuum Science & Technology B, 24(5), 2209, 2006 |