화학공학소재연구정보센터
검색결과 : 6건
No. Article
1 Adsorption and Desorption Kinetics of a Block Copolymer Wetting Agent Used in Copper Electroplating
Willey MJ, McInerney EJ
Journal of the Electrochemical Society, 156(3), D98, 2009
2 Integrated multiscale three-dimensional simulation approach in local interconnect gap-fill optimization
Sukharev V, Kumar K, Li WD, Zhao J, Pyka W, McInerney EJ, Joh S
Journal of Vacuum Science & Technology B, 19(5), 1879, 2001
3 Design of a 300 mm chemical vapor deposition tungsten reactor using computational fluid dynamics
McInerney EJ, Pratt TM, Taheri A
Journal of Vacuum Science & Technology A, 17(4), 1352, 1999
4 Experimental and analytical study of seed layer resistance for copper damascene electroplating
Broadbent EK, McInerney EJ, Gochberg LA, Jackson RL
Journal of Vacuum Science & Technology B, 17(6), 2584, 1999
5 Appliance manufacturers' perspective on energy standards
McInerney EJ, Anderson V
Energy and Buildings, 26(1), 17, 1997
6 Study of Station Flow Dynamics in a Sequential Multiwafer Chemical-Vapor-Deposition Batch Reactor Using Reactor Modeling
Mcinerney EJ
Journal of Vacuum Science & Technology A, 14(3), 1152, 1996