검색결과 : 9건
| No. | Article |
|---|---|
| 1 |
Measurements of acid generation by extreme ultraviolet irradiation in lithographic films Glodde M, Goldfarb DL, Medeiros DR, Wallraff GM, Denbeaux GP Journal of Vacuum Science & Technology B, 25(6), 2496, 2007 |
| 2 |
Sub-50 nm half-pitch imaging,with a low activation energy chemically amplified photoresist Wallraff GM, Medeiros DR, Sanchez M, Petrillo K, Huang WS, Rettner C, Davis B, Larson CE, Sundberg L, Brock PJ, Hinsberg WD, Houle FA, Hoffnagle JA, Goldfarb D, Temple K, Wind S, Bucchignano J Journal of Vacuum Science & Technology B, 22(6), 3479, 2004 |
| 3 |
[(CH3)(3)NCH2CH2NH3]SnI4: A layered perovskite with quaternary/primary ammonium dications and short interlayer iodine-iodine contacts Xu ZT, Mitzi DB, Medeiros DR Inorganic Chemistry, 42(5), 1400, 2003 |
| 4 |
Hybrid field-effect transistor based on a low-temperature melt-processed channel layer Mitzi DB, Dimitrakopoulos CD, Rosner J, Medeiros DR, Xu ZT, Noyan C Advanced Materials, 14(23), 1772, 2002 |
| 5 |
Intercalated organic-inorganic perovskites stabilized by fluoroaryl-aryl interactions Mitzi DB, Medeiros DR, Malenfant PRL Inorganic Chemistry, 41(8), 2134, 2002 |
| 6 |
Relationship between deprotection and film thickness loss during plasma etching of positive tone chemically amplified resists Mahorowala AP, Medeiros DR Journal of Vacuum Science & Technology A, 19(4), 1374, 2001 |
| 7 |
Transfer etching of bilayer resists in oxygen-based plasmas Mahorowala AP, Babich K, Lin Q, Medeiros DR, Petrillo K, Simons J, Angelopoulos M, Sooriyakumaran R, Hofer D, Reynolds GW, Taylor JW Journal of Vacuum Science & Technology A, 18(4), 1411, 2000 |
| 8 |
Design of photoresists with reduced environmental impact. II. Water-soluble resists based on photocrosslinking of poly(2-isopropenyl-2-oxazoline) Havard JM, Yoshida M, Pasini D, Vladimirov N, Frechet JMJ, Medeiros DR, Patterson K, Yamada S, Willson CG, Byers JD Journal of Polymer Science Part A: Polymer Chemistry, 37(9), 1225, 1999 |
| 9 |
Study of resolution limits due to intrinsic bias in chemically amplified photoresists Postnikov SV, Stewart MD, Tran HV, Nierode MA, Medeiros DR, Cao T, Byers J, Webber SE, Wilson CG Journal of Vacuum Science & Technology B, 17(6), 3335, 1999 |