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| No. | Article |
|---|---|
| 1 |
CH4/H-2/Ar/Cl-2 Electron-Cyclotron-Resonance Plasma-Etching of via Holes for InP-Based Microwave Devices Khare R, Brown J, Hu M, Pierson D, Melendes M, Constantine C Journal of Vacuum Science & Technology B, 12(5), 2947, 1994 |