검색결과 : 28건
| No. | Article |
|---|---|
| 1 |
Multifunctional and recyclable TiO2 hybrid sponges for efficient sorption, detection, and photocatalytic decomposition of organic pollutants Lee YJ, Lee SK, Kim HS, Moon JT, Joo JB, Choi IH Journal of Industrial and Engineering Chemistry, 73, 328, 2019 |
| 2 |
An All-Solid-State Li-Ion Battery with a Pre-Lithiated Si-Ti-Ni Alloy Anode Yersak TA, Son SB, Cho JS, Suh SS, Kim YU, Moon JT, Oh KH, Lee SH Journal of the Electrochemical Society, 160(9), A1497, 2013 |
| 3 |
An All-Solid-State Li-Ion Battery with a Pre-Lithiated Si-Ti-Ni Alloy Anode (vol 160, pg A1497, 2013) Yersak TA, Son SB, Cho JS, Suh SS, Kim YU, Moon JT, Oh KH, Lee SH Journal of the Electrochemical Society, 160(10), X13, 2013 |
| 4 |
Leakage current mechanisms in sub-50 nm recess-channel-type DRAM cell transistors with three-terminal gate-controlled diodes Chung EA, Kim YP, Nam KJ, Lee S, Min JY, Shin YG, Choi S, Jin G, Moon JT, Kim S Solid-State Electronics, 56(1), 219, 2011 |
| 5 |
Etching characteristics and modeling for oval-shaped contact Park SC, Lim SH, Shin CH, Min GJ, Kang CJ, Cho HK, Moon JT Thin Solid Films, 515(12), 4923, 2007 |
| 6 |
Change in depth profile of N highly incorporated into SiO2 by plasma-assisted nitridation Cho MH, Chung KB, Kim YK, Kim DC, Heo JH, Koo BY, Shin YK, Chung UI, Moon JT, Ko DH Electrochemical and Solid State Letters, 9(5), F27, 2006 |
| 7 |
Dopant loss of ultrashallow junction by wet chemical cleaning Buh GH, Park T, Yon GH, Kim SB, Jee YJ, Hong SJ, Ryoo C, Yoo JR, Lee JW, Jun CS, Shin YG, Chung UI, Moon JT Journal of Vacuum Science & Technology B, 24(1), 499, 2006 |
| 8 |
Quantitative analysis of ultrashallow junction of sub-50 nm gate-length transistors: Junction depth, sheet resistance, short channel effects, and transistor performance Buh GH, Park T, Yon GH, Hong SJ, Ryoo CW, Yoo JR, Lee JW, Jee YJ, Lee JS, Jun CS, Shin YG, Chung UI, Moon JT Journal of Vacuum Science & Technology B, 24(1), 503, 2006 |
| 9 |
Converging lithography by combination of electrostatic layer-by-layer self-assembly and 193 nm photolithography: Top-down meets bottom-up Hah JH, Mayya S, Hata M, Jang YK, Kim HW, Ryoo M, Woo SG, Cho HK, Moon JT Journal of Vacuum Science & Technology B, 24(5), 2209, 2006 |
| 10 |
Impact of registration error of reticle on total overlay error budget Lee DY, Chun YJ, Yoon JB, Lee SH, Lee SJ, Cho HK, Moon JT Journal of Vacuum Science & Technology B, 24(6), 3105, 2006 |