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| No. | Article |
|---|---|
| 1 |
Spin-coatable HfO2 resist for optical and electron beam lithographies Saifullah MSM, Khan MZR, Hasko DG, Leong ESP, Neo XL, Goh ETL, Anderson D, Jones GAC, Welland ME Journal of Vacuum Science & Technology B, 28(1), 90, 2010 |