검색결과 : 17건
| No. | Article |
|---|---|
| 1 |
Characterization of Gaseous Plasma Sustained in Mixtures of HMDSO and O-2 in an Industrial-Scale Reactor Gosar Z, Kovac J, Mozetic M, Primc G, Vesel A, Zaplotnik R Plasma Chemistry and Plasma Processing, 40(1), 25, 2020 |
| 2 |
Characteristics of a plasma information variable in phenomenology-based, statistically-tuned virtual metrology to predict silicon dioxide etching depth Jang YC, Roh HJ, Park S, Jeong S, Ryu S, Kwon JW, Kim NK, Kim GH Current Applied Physics, 19(10), 1068, 2019 |
| 3 |
Rotating Gliding Arc Assisted Water Splitting in Atmospheric Nitrogen Zhang H, Zhu FS, Li XD, Cen KF, Du CM, Tu X Plasma Chemistry and Plasma Processing, 36(3), 813, 2016 |
| 4 |
Moisture Removal from Natural Jute Fibre by Plasma Drying Process Morshed MM, Alam MM, Daniels SM Plasma Chemistry and Plasma Processing, 32(2), 249, 2012 |
| 5 |
Introduction of Primary Amino Groups on Poly(ethylene terephthalate) Surfaces by Ammonia and a Mix of Nitrogen and Hydrogen Plasma Casimiro J, Lepoittevin B, Boisse-Laporte C, Barthes-Labrousse MG, Jegou P, Brisset F, Roger P Plasma Chemistry and Plasma Processing, 32(2), 305, 2012 |
| 6 |
Measurement of extreme ultraviolet light and electron temperature for a dense plasmas from hypocycloidal pinch device Hong YJ, Lee SH, Uhm HS, Choi EH Current Applied Physics, 11(5), S177, 2011 |
| 7 |
In-Line Investigations of Atmospheric Pressure Plasma Processes in Correlation with Surface Analysis Gunther S, Teuscher N, Heilmann A, Hansel R, Voigt HM, Kiesow A Journal of Adhesion Science and Technology, 25(8), 857, 2011 |
| 8 |
Effects of UV photon irradiation on SiOx (0 < x < 2) structural properties Tomozeiu N Applied Surface Science, 253(1), 376, 2006 |
| 9 |
Optical emission spectroscopy during fabrication of indium-tin-oxynitride films by RF-sputtering Koufaki M, Sifakis M, Iliopoulos E, Pelekanos N, Modreanu A, Cimalla V, Ecke G, Aperathitis E Applied Surface Science, 253(1), 405, 2006 |
| 10 |
Growth and microstructures of carbon nanotube films prepared by microwave plasma enhanced chemical vapor deposition process Srivastava SK, Vankar VD, Kumar V Thin Solid Films, 515(4), 1552, 2006 |