화학공학소재연구정보센터
검색결과 : 19건
No. Article
1 The influence of tertiary butyl hydrazine as a co-reactant on the atomic layer deposition of silver
Golrokhi Z, Marshall PA, Romani S, Rushworth S, Chalker PR, Potter RJ
Applied Surface Science, 399, 123, 2017
2 Self-limiting atomic layer deposition of conformal nanostructured silver films
Golrokhi Z, Chalker S, Sutcliffe CJ, Potter RJ
Applied Surface Science, 364, 789, 2016
3 Selectivity of cobalt-based catalysts towards hydrogen peroxide formation during the reduction of oxygen
Campos M, Siriwatcharapiboon W, Potter RJ, Horswell SL
Catalysis Today, 202, 135, 2013
4 Gadolinium nitride films deposited using a PEALD based process
Fang ZW, Williams PA, Odedra R, Jeon H, Potter RJ
Journal of Crystal Growth, 338(1), 111, 2012
5 Atomic layer deposition of TaN and Ta3N5 using pentakis(dimethylamino) tantalum and either ammonia or monomethylhydrazine
Fang ZW, Aspinall HC, Odedra R, Potter RJ
Journal of Crystal Growth, 331(1), 33, 2011
6 Modification of the electrical properties of PEDOT:PSS by the incorporation of ZnO nanoparticles synthesized by laser ablation
Semaltianos NG, Logothetidis S, Hastas N, Perrie W, Romani S, Potter RJ, Dearden G, Watkins KG, French P, Sharp M
Chemical Physics Letters, 484(4-6), 283, 2010
7 Electroreduction of oxygen on carbon-supported gold catalysts
Erikson H, Jurmann G, Sarapuu A, Potter RJ, Tammeveski K
Electrochimica Acta, 54(28), 7483, 2009
8 High-k materials and their response to gamma ray radiation
Zhao CZ, Taylor S, Werner M, Chalker PR, Potter RJ, Gaskell JM, Jones AC
Journal of Vacuum Science & Technology B, 27(1), 411, 2009
9 Investigation of optical and electronic properties of hafnium aluminate films deposited by Metal-Organic Chemical Vapour Deposition
Buiu O, Lu Y, Hall S, Mitrovic IZ, Potter RJ, Chalker PR
Thin Solid Films, 515(7-8), 3772, 2007
10 Spectroellipsometric assessment of HfO2 thin films
Buiu O, Lu Y, Mitrovic IZ, Hall S, Chalker P, Potter RJ
Thin Solid Films, 515(2), 623, 2006