화학공학소재연구정보센터
검색결과 : 31건
No. Article
1 Low Stress Heteroepitaxial 3C-SiC Films Characterized by Microstructure Fabrication and Finite Elements Analysis
Anzalone R, Camarda M, Locke C, Alquier D, Severino A, Italia M, Rodilosso D, Tringali C, La Magna A, Foti G, Saddow SE, La Via F, D'Arrigo G
Journal of the Electrochemical Society, 157(4), H438, 2010
2 Growth of cubic silicon carbide on oxide using polysilicon as a seed layer for micro-electro-mechanical machine applications
Frewin CL, Locke C, Wang J, Spagnol P, Saddow SE
Journal of Crystal Growth, 311(17), 4179, 2009
3 Electronic passivation of 3C-SiC(001) via hydrogen treatment
Coletti C, Frewin CL, Hoff AM, Saddow SE
Electrochemical and Solid State Letters, 11(10), H285, 2008
4 Silane overpressure post-implant annealing of Al dopants in SiC: Cold wall CVD apparatus
Rao S, Bergamini F, Nipoti R, Saddow SE
Applied Surface Science, 252(10), 3837, 2006
5 High growth rates (> 30 mu m/h) of 4H-SiC epitaxial layers using a horizontal hot-wall CVD reactor
Myers RL, Shishkin Y, Kordina O, Saddow SE
Journal of Crystal Growth, 285(4), 486, 2005
6 Increased growth rate in a SiCCVD reactor using HCl as a growth additive
Myers R, Kordina O, Shishkin Z, Rao S, Everly R, Saddow SE
Materials Science Forum, 483, 73, 2005
7 Regrowth of 3C-SiC on CMP treated 3C-SiC/Si epitaxial layers
Mank H, Moisson C, Turover D, Twigg M, Saddow SE
Materials Science Forum, 483, 197, 2005
8 Concentration of N and P in SIC investigated by time-of-flight secondary ion mass spectrometry (TOF-SIMS)
Acarturk T, Semmelroth K, Pensl G, Saddow SE, Starke U
Materials Science Forum, 483, 453, 2005
9 J-v characteristics of Al+ ion implanted p(+)/n 4H-SiC diodes annealed in silane ambient at 1600 degrees C
Bergamini A, Rao SP, Saddow SE, Nipoti R
Materials Science Forum, 483, 629, 2005
10 Structure and morphology of 4H-SiC wafer surfaces after H-2-Etching
Soubatch S, Saddow SE, Rao SP, Lee WY, Konuma M, Starke U
Materials Science Forum, 483, 761, 2005