검색결과 : 16건
No. | Article |
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1 |
Large temperature range model for the atmospheric pressure Chemical vapor deposition of Silicon dioxide films on thermosensitive substrates Topka KC, Chliavoras GA, Senocq F, Vergnes H, Samelor D, Sadowski D, Vahlas C, Caussat B Chemical Engineering Research & Design, 161, 146, 2020 |
2 |
Influence of the crystal structure of Ag2CO3 on the photocatalytic activity under visible light of Ag2CO3-Palygorskite nanocomposite material Lakbita O, Rhouta B, Maury F, Senocq F, Amjoud M, Daoudi L Applied Surface Science, 464, 205, 2019 |
3 |
Chemical vapor deposition of Pd/Cu alloy films from a new single source precursor Krisyuk VV, Shubin YV, Senocq F, Turgambaeva AE, Duguet T, Igumenov IK, Vahlas C Journal of Crystal Growth, 414, 130, 2015 |
4 |
Surface-driven, one-step chemical vapor deposition of gamma-Al4Cu9 complex metallic alloy film Prud'homme N, Duguet T, Samelor D, Senocq F, Vahlas C Applied Surface Science, 283, 788, 2013 |
5 |
Al-Cu intermetallic coatings processed by sequential metalorganic chemical vapour deposition and post-deposition annealing Aloui L, Duguet T, Haidara F, Record MC, Samelor D, Senocq F, Mangelinck D, Vahlas C Applied Surface Science, 258(17), 6425, 2012 |
6 |
CVD of Pure Copper Films from Amidinate Precursor Krisyuk V, Aloui L, Prud'homme N, Sysoev S, Senocq F, Samelor D, Vahlas C Electrochemical and Solid State Letters, 14(3), D26, 2011 |
7 |
Deposition of tin oxide, iridium and iridium oxide films by metal-organic chemical vapor deposition for electrochemical wastewater treatment Klamklang S, Vergnes H, Senocq F, Pruksathorn K, Duverneuil P, Damronglerd S Journal of Applied Electrochemistry, 40(5), 997, 2010 |
8 |
Chemical Vapor Deposition of Iron, Iron Carbides, and Iron Nitride Films from Amidinate Precursors Krisyuk V, Gleizes AN, Aloui L, Turgambaeva A, Sarapata B, Prud'Homme N, Senocq F, Samelor D, Zielinska-Lipiec A, de Caro D, Vahlas C Journal of the Electrochemical Society, 157(8), D454, 2010 |
9 |
Vapor phase surface functionalization under ultra violet activation of parylene thin films grown by chemical vapor deposition Santucci V, Maury F, Senocq F Thin Solid Films, 518(6), 1675, 2010 |
10 |
Metallic polycrystalline thin films of the single-component neutral molecular solid Ni(tmdt)(2) Malfant I, Rivasseau K, Fraxedas J, Faulmann C, De Caro D, Valade L, Kaboub L, Fabre JM, Senocq F Journal of the American Chemical Society, 128(17), 5612, 2006 |