검색결과 : 8건
No. | Article |
---|---|
1 |
Interdependence of optimum exposure dose regimes and the kinetics of resist dissolution for electron beam nanolithography of polymethylmethacrylate Mohammad MA, Fito T, Chen J, Aktary M, Stepanova M, Dew SK Journal of Vacuum Science & Technology B, 28(1), L1, 2010 |
2 |
Nanomachining and clamping point optimization of silicon carbon nitride resonators using low voltage electron beam lithography and cold development Mohammad MA, Guthy C, Evoy S, Dew SK, Stepanova M Journal of Vacuum Science & Technology B, 28(6), C6P36, 2010 |
3 |
Simulation of electron beam lithography of nanostructures Stepanova M, Fito T, Szabo Z, Alti K, Adeyenuwo AP, Koshelev K, Aktary M, Dew SK Journal of Vacuum Science & Technology B, 28(6), C6C48, 2010 |
4 |
Phase behavior of amphiphilic lipid molecules at air-water interfaces: An off-lattice self-consistent-field modeling Lauw Y, Kovalenko A, Stepanova M Journal of Physical Chemistry B, 112(7), 2119, 2008 |
5 |
Nanoscale resist morphologies of dense gratings using electron-beam lithography Mohammad MA, Dew SK, Westra K, Li P, Aktary M, Lauw Y, Kovalenko A, Stepanova M Journal of Vacuum Science & Technology B, 25(3), 745, 2007 |
6 |
Self-organized Cu nanowires on glass and Si substrates from sputter etching Cu/substrate interfaces Stepanova M, Dew SK Journal of Vacuum Science & Technology B, 24(2), 592, 2006 |
7 |
Simulation of the spatial distribution and molecular weight of polymethylmethacrylate fragments in electron beam lithography exposures Aktary M, Stepanova M, Dew SK Journal of Vacuum Science & Technology B, 24(2), 768, 2006 |
8 |
Estimates of differential sputtering yields for deposition applications Stepanova M, Dew SK Journal of Vacuum Science & Technology A, 19(6), 2805, 2001 |