검색결과 : 4건
| No. | Article |
|---|---|
| 1 |
Characteristics of chemically vapor deposited TiN films prepared using tetrakis-ethylmethyl-amido-titanium Kim DH, Lim GT, Kim SK, Park JW, Lee JG Journal of Vacuum Science & Technology B, 17(5), 2197, 1999 |
| 2 |
Low temperature chemical vapor deposition of titanium nitride films from tetrakis(ethylmethylamido)titanium and ammonia Panda S, Kim J, Weiller BH, Economou DJ, Hoffman DM Thin Solid Films, 357(2), 125, 1999 |
| 3 |
Low-temperature deposition of films from tetrakis(dimethylamido)titanium and ammonia Berry A, Mowery R, Turner NH, Seitzman L, Dunn D, Ladouceur H Thin Solid Films, 323(1-2), 10, 1998 |
| 4 |
Aspects of Nitrogen Surface-Chemistry Relevant to Tin Chemical-Vapor-Deposition Schulberg MT, Allendorf MD, Outka DA Journal of Vacuum Science & Technology A, 14(6), 3228, 1996 |