화학공학소재연구정보센터
검색결과 : 12건
No. Article
1 Shallow junction characteristics due to low temperature BGe molecular ion implantation into silicon
Liang JH, Wu CH
Applied Surface Science, 310, 230, 2014
2 TCAD modeling and simulation of boron deactivation in NMOS carbon-implanted channel
Mok KRC, Benistant F, Teo RS, Chu S
Solid-State Electronics, 53(6), 658, 2009
3 From point defects to dislocation loops: A comprehensive modelling framework for self-interstitial defects in silicon
Martin-Bragado I, Avci I, Zographos N, Jaraiz M, Castrillo P
Solid-State Electronics, 52(9), 1430, 2008
4 Continuum modeling of post-implantation damage and the effective plus factor in crystalline silicon at room temperature
Chan HY, Srinivasan MP, Benistant F, Mok KR, Chan L, Jin HM
Thin Solid Films, 504(1-2), 269, 2006
5 Formation and control of box-shaped ultra-shallow junction using laser annealing and pre-amorphization implantation
Kim SD, Park CM, Woo JCS
Solid-State Electronics, 49(1), 131, 2005
6 The deep boron level in high-voltage PiN diodes
Aberg D, Hallen A, Osterman J, Zimmermann U, Svensson BG
Materials Science Forum, 389-3, 1309, 2002
7 Doping of silicon carbide by ion implantation
Svensson BG, Hallen A, Linnarsson MK, Kuznetsov AY, Janson MS, Aberg D, Osterman J, Persson POA, Hultman L, Storasta L, Carlsson FHC, Bergman JP, Jagadish C, Morvan E
Materials Science Forum, 353-356, 549, 2001
8 Channel engineering using RTA prior to the gate oxidation for high density DRAM with single gate CMOS technology
Son JH, Lee SH, Lee JS, Lee Y
Solid-State Electronics, 45(1), 7, 2001
9 Epitaxy and device behaviour of collector-up SiGeHBTs with a partial p-type collector
van den Oever LCM, Nanver LK, Scholtes TLM, van Zeijl HW, van Noort WD, Ren QW, Slotboom JW
Solid-State Electronics, 45(11), 1899, 2001
10 Influence of transient enhanced diffusion of the intrinsic base dopant profile on SiGeHBT DC and HF characteristics
Malm BG, Grahn JV, Ostling M
Solid-State Electronics, 44(10), 1747, 2000