검색결과 : 3건
| No. | Article |
|---|---|
| 1 |
Effect on plasma and etch-rate uniformity of controlled phase shift between rf voltages applied to powered electrodes in a triode capacitively coupled plasma reactor Sung DY, Jeong SM, Park YM, Volynets VN, Ushakov AG, Kim GH Journal of Vacuum Science & Technology A, 27(1), 13, 2009 |
| 2 |
Experimental study of spatial nonuniformities in 100 MHz capacitively coupled plasma using optical probe Volynets VN, Ushakov AG, Sung D, Tolmachev YN, Pashkovsky VG, Lee JB, Kwon TY, Jeong KS Journal of Vacuum Science & Technology A, 26(3), 406, 2008 |
| 3 |
Production of energetic ions in plasma by ambipolar fields: Application to etching Park W, Tolmachev YN, Volynets VN, Pashkovskiy VG Journal of Vacuum Science & Technology A, 25(4), 726, 2007 |