검색결과 : 9건
| No. | Article |
|---|---|
| 1 |
Structure and hardness of a-C:H films prepared by middle frequency plasma chemical vapor deposition Guo GW, Tang GZ, Wang YJ, Ma XX, Sun MR, Wang LQ, Yukimura K Applied Surface Science, 257(10), 4738, 2011 |
| 2 |
Microstructure modifications and corrosion behaviors of Cr4Mo4V steel treated by high current pulsed electron beam Xu FJ, Guo GW, Tang GZ, Ma XM, Wang LQ, Ozur GE, Yukimura K Materials Chemistry and Physics, 126(3), 904, 2011 |
| 3 |
Hydrogen oxidation in H(2)/O(2)/N(2) gas mixture by pulsed DBD at atmospheric pressure Kambara S, Kuriyamaa R, Osakabe T, Yukimura K International Journal of Hydrogen Energy, 33(22), 6792, 2008 |
| 4 |
Efficient decomposition of NO by ammonia radical-injection method using an intermittent dielectric barrier discharge Yukimura K, Kawamura K, Hiramatsu T, Murakami H, Kambara S, Moritomi H, Yamashita T Thin Solid Films, 515(9), 4278, 2007 |
| 5 |
Characteristics of magnetically driven shunting arc plasma for amorphous carbon film deposition Takaki K, Kumagai O, Hasegawa R, Mukaigawa S, Fujiwara T, Kumagai M, Yukimura K Thin Solid Films, 506, 150, 2006 |
| 6 |
Effect Of O-2 on NO removal by ammonia radical injection using one-cycle sinusoidal power source Yamamoto K, Yukimura K, Kambara S, Moritomi H, Yamashita T, Maruyama T Thin Solid Films, 457(1), 39, 2004 |
| 7 |
Tribological properties of nanostructured and conventional WC-Co coatings deposited by plasma spraying Zhu YC, Yukimura K, Ding CX, Zhang PY Thin Solid Films, 388(1-2), 277, 2001 |
| 8 |
Titanium nitride prepared by plasma-based titanium-ion implantation Yukimura K, Sano M, Maruyama T, Kurooka S, Suzuki Y, Chayahara A, Kinomura A, Horino Y Journal of Vacuum Science & Technology B, 17(2), 840, 1999 |
| 9 |
Pulsed metal ion source by triggerless shunting arc discharge Yukimura K, Isono R, Monguchi T, Yoshioka K, Masamune S Journal of Vacuum Science & Technology B, 17(2), 871, 1999 |