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Pulsed laser chemical vapor deposition of a mixture of W, WO2, and WO3 from W(CO)(6) at atmospheric pressure Jeong K, Lee J, Byun I, Seong MJ, Park J, Nam HS, Lee J Thin Solid Films, 626, 145, 2017 |
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Influence of surface morphology and microstructure on performance of CVD tungsten coating under fusion transient thermal loads Lian YY, Liu X, Wang JB, Feng F, Lv YW, Song JP, Chen JM Applied Surface Science, 390, 167, 2016 |
3 |
Blue to red emission from as-deposited nc-silicon/silicon dioxide by hot wire chemical vapor deposition Dutt A, Matsumoto Y, Santoyo-Salazar J, Santana-Rodriguez G, Godavarthi S Thin Solid Films, 595, 221, 2015 |
4 |
Flexible electrochromic devices based on crystalline WO3 nanostructures produced with hot-wire chemical vapor deposition White CM, Gillaspie DT, Whitney E, Lee SH, Dillon AC Thin Solid Films, 517(12), 3596, 2009 |
5 |
A novel method for suppressing silicidation of tungsten catalyzer during silane decomposition in Cat-CVD Honda K, Ohdaira K, Matsumura H Thin Solid Films, 516(5), 826, 2008 |
6 |
Defect formation of chemical-vapor deposited tungsten on rapid thermal-annealed TiN/Ti Kim SD, Kim CH Thin Solid Films, 516(18), 6310, 2008 |
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Quantitative analysis of tungsten, oxygen and carbon concentrations in the microcrystalline silicon films deposited by hot-wire CVD Bouree JE, Guillet J, Grattepain C, Chaumont J Thin Solid Films, 430(1-2), 110, 2003 |
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Mathematical Modeling for Chemical Vapor Deposition in a Single-Wafer Reactor: Application to Low-Pressure Deposition of Tungsten Park JH Korean Journal of Chemical Engineering, 19(3), 391, 2002 |
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Atmospheric pressure chemical vapor deposition of electrochromic tungsten oxide films Gordon RG, Barry S, Barton JT, Broomhall-Dillard RNR Thin Solid Films, 392(2), 231, 2001 |
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Low temperature chemical vapor deposition of tungsten carbide for copper diffusion barriers Sun YM, Lee SY, Lemonds AM, Engbrecht ER, Veldman S, Lozano J, White JM, Ekerdt JG, Emesh I, Pfeifer K Thin Solid Films, 397(1-2), 109, 2001 |