화학공학소재연구정보센터
검색결과 : 9건
No. Article
1 How the interaction between In2O3-ZrO2 promotes the isobutene synthesis from ethanol?
Bronsato BJD, Zonetti PC, Moreira CR, Mendoza CD, da Costa MEHM, Alves OC, de Avillez RR, Appel LG
Catalysis Today, 381, 224, 2021
2 Growth of single-layer graphene on Ge (100) by chemical vapor deposition
Mendoza CD, Caldas PG, Freire FL, da Costa MEHM
Applied Surface Science, 447, 816, 2018
3 A comprehensive study on different silicon-containing interlayers for a-C:H adhesion on ferrous alloys
Boeira CD, Leidens LM, Cemin F, Petry ER, da Costa MEHM, Camargo SS, Michels AF, Figueroa CA
Thin Solid Films, 645, 351, 2018
4 Enhanced stability of plasmonic metal thin films by CVD grown graphene transfer
Del Rosso T, Zaman Q, Romani EC, Pandoli O, Aucelio RQ, de Lima LM, Cremona M, Dmitriev V, da Costa KQ, Freire F, da Costa MEHM
Thin Solid Films, 644, 65, 2017
5 Synthesis and characterization of graphene layers prepared by low-pressure chemical vapor deposition using triphenylphosphine as precursor
Mastrapa GC, da Costa MEHM, Larrude DG, Freire FL
Materials Chemistry and Physics, 166, 37, 2015
6 Nitrogen incorporation into titanium diboride films deposited by dc magnetron sputtering: Structural modifications
Sanchez CMT, Fonseca HD, da Costa MEHM, Freire FL
Thin Solid Films, 517(19), 5683, 2009
7 Structural, mechanical, and nanoscale tribological properties of nitrogen-incorporated fluorine-carbon films
da Costa MEHM, Sanchez CMT, Jacobsohn LG, Freire FL
Thin Solid Films, 482(1-2), 109, 2005
8 Effects of thermal annealing on the structural, mechanical, and tribological properties of hard fluorinated carbon films deposited by plasma enhanced chemical vapor deposition
da Costa MEHM, Baumvol IJR, Radke C, Jacobsohn LG, Zamora RRM, Freire FL
Journal of Vacuum Science & Technology A, 22(6), 2321, 2004
9 Structural and mechanical characterization of fluorinated amorphous-carbon films deposited by plasma decomposition of CF4-CH4 gas mixtures
Jacobsohn LG, Franceschini DF, da Costa MEHM, Freire FL
Journal of Vacuum Science & Technology A, 18(5), 2230, 2000