화학공학소재연구정보센터
검색결과 : 8건
No. Article
1 Improved DC and RF performance of InAlAs/InGaAs InP based HEMTs using ultra-thin 15 nm ALD-Al(2)O3 surface passivation
Asif M, Chen C, Peng D, Xi W, Zhi J
Solid-State Electronics, 142, 36, 2018
2 ALD Al2O3 passivation of L-g=100 nm metamorphic InAlAs/InGaAs HEMTs with Si-doped Schottky layers on GaAs substrates
Sun B, Chang HD, Wang SK, Niu JB, Liu HG
Solid-State Electronics, 138, 40, 2017
3 Ultra-thin 20 nm-PECVD-Si3N4 surface passivation in T-shaped gate InAlAs/InGaAs InP-based HEMTs and its impact on DC and RF performance
Ding P, Chen C, Ding WC, Yang F, Su YB, Wang DH, Jin Z
Solid-State Electronics, 123, 1, 2016
4 Step-by-step implementation of an amplifier circuit with a graphene field-effect transistor on a printed-circuit board
Lee J, Lee J, Seo DH, Shin H, Park S, Chung HJ
Current Applied Physics, 14(8), 1057, 2014
5 High frequency performance of sub-100 nm UTB-FDSOI featuring TiN/HfO2 gate stack
Lim TC, Rozeau O, Buj C, Paccaud M, Lepilliet S, Dambrine G, Danneville F
Solid-State Electronics, 53(4), 433, 2009
6 Transit times of SiGe : C HBTs using nonselective base epitaxy
Zerounian N, Rodriguez M, Enciso M, Aniel F, Chevalier P, Martinet B, Chantre A
Solid-State Electronics, 48(10-11), 1993, 2004
7 Development and demonstration of high-power X-band SiC MESFETs
Chang HR, Hanna E, Hacker J, Hackett R, Bui C
Materials Science Forum, 389-3, 1367, 2002
8 Characterization of SiC MESFETs on conducting substrates
Nilsson PA, Saroukhan AM, Svedberg JO, Konstantinov A, Karlsson S, Adas C, Gustafsson U, Harris C, Rorsman N, Eriksson J, Zirath H
Materials Science Forum, 338-3, 1255, 2000