화학공학소재연구정보센터
검색결과 : 3건
No. Article
1 Low temperature deposition of a-SiC:H thin films applying a dual plasma source process
Frischmuth T, Schneider M, Radovic IB, Siketic Z, Maurer D, Grille T, Schmid U
Thin Solid Films, 616, 164, 2016
2 Optimization of the Deposition Parameters of DLC Coatings with the IC-PECVD Method
Singh TP, Jatti VS
Particulate Science and Technology, 33(2), 119, 2015
3 Low dielectric constant plasma polymerized methyl-cyclohexane thin films deposited by inductively coupled plasma-enhanced chemical vapor deposition
Jo H, Quan YC, Jung D
Thin Solid Films, 384(1), 33, 2001