검색결과 : 5건
| No. | Article |
|---|---|
| 1 |
Base-Amplifying Silicone Resins with Photobase-Generating Side Chains and Their Application to Negative-Working Photoresists Furutani M, Kobayashi H, Gunji T, Abe Y, Arimitsu K Journal of Polymer Science Part A: Polymer Chemistry, 53(10), 1205, 2015 |
| 2 |
Recent progress in negative-working photosensitive and thermally stable polymers Higashihara T, Saito Y, Mizoguchi K, Ueda M Reactive & Functional Polymers, 73(2), 303, 2013 |
| 3 |
Negative-working photoresist based on a first-generation dendrimer consisting of 4,4-diphenylpentyloxy units Kamimura Y, Haba O, Endo T, Ueda M Journal of Polymer Science Part A: Polymer Chemistry, 43(6), 1210, 2005 |
| 4 |
Negative-working photoresist of methacrylate polymers based on the transesterification of the 2-hydroxyethyl group in the presence of an acid Lee J, Aoai T, Kondo S, Miyagawa N, Takahara S, Yamaoka T Journal of Polymer Science Part A: Polymer Chemistry, 40(11), 1858, 2002 |
| 5 |
Novel photosensitive polymer based on polycarbodiimide and photoamine generator Mochizuki A, Sakamoto M, Yoshioka M, Fukuoka T, Takeshi K, Ueda M Journal of Polymer Science Part A: Polymer Chemistry, 38(2), 329, 2000 |