| 1 |
Solution-processed crack-free oxide films formed using SiO2 nanoparticles and organoalkoxysiloxane precursors
Na M, Rhee SW
Applied Surface Science, 342, 168, 2015 |
| 2 |
Reduction of carbon impurities in silicon oxide films prepared by rf plasma-enhanced CVD
Teshima K, Inoue Y, Sugimura H, Takai O
Thin Solid Films, 390(1-2), 88, 2001 |
| 3 |
Microstructuring of conducting polymers
Schultze JW, Morgenstern T, Schattka D, Winkels S
Electrochimica Acta, 44(12), 1847, 1999 |
| 4 |
First principle study of hydrogen passivated Si(100) initial state of oxidation
Esteve A, Rouhani MD, Esteve D
Thin Solid Films, 343-344, 350, 1999 |
| 5 |
In situ observation of behavior of organosilicon molecules in low-temperature plasma enhanced CVD
Inoue Y, Sugimura H, Takai O
Thin Solid Films, 345(1), 90, 1999 |
| 6 |
Deposition of SiO2 films from novel alkoxysilane/O-2 plasmas
Bogart KHA, Ramirez SK, Gonzales LA, Bogart GR, Fisher ER
Journal of Vacuum Science & Technology A, 16(6), 3175, 1998 |
| 7 |
Characterization of the Oxidized Indium Thin-Films with Thermal-Oxidation
Lee MS, Choi WC, Kim EK, Kim CK, Min SK
Thin Solid Films, 279(1-2), 1, 1996 |
| 8 |
Plasma and Surface Diagnostics During Plasma-Enhanced Chemical-Vapor-Deposition of SiO2 from SiH4/O-2/Ar Discharges
Han SM, Aydil ES
Thin Solid Films, 290-291, 427, 1996 |
| 9 |
Plasma-Enhanced Chemical-Vapor-Deposition of SiO2 Using Novel Alkoxysilane Precursors
Bogart KH, Dalleska NF, Bogart GR, Fisher ER
Journal of Vacuum Science & Technology A, 13(2), 476, 1995 |
| 10 |
RF Plasma Deposition from Hexamethyldisiloxane Oxygen Mixtures
Sahli S, Segui Y, Ramdani S, Takkouk Z
Thin Solid Films, 250(1-2), 206, 1994 |
