1 - 9 |
Novel Si-Ge-C superlattices and their applications Augusto CJRP, Forester L |
10 - 13 |
Threshold voltage and transconductance shifting reliance on strained-SiGe channel dimension Chang WT, Lin YS, Shih CT |
14 - 18 |
SiGe channel deposition by batch epitaxy Reichel C, Schoenekess J, Dietel A, Wasyluk J, Chow YT, Kammler T |
19 - 22 |
Facet engineering for SiGe/Si stressors in advanced CMOS technology Kasim J, Reichel C, Dilliway G, Bai B, Zakowsky N |
23 - 28 |
Optimization of ISBD embedded SiGe layers to prevent delamination process for MOSFET applications Wasyluk J, Ge Y, Wurster K, Lenski M, Reichel C |
29 - 34 |
Arsenic atomic layer doping in Si using AsH3 Yamamoto Y, Kurps R, Murota J, Tillack B |
35 - 39 |
Revealing high room and low temperatures mobilities of 2D holes in a strained Ge quantum well heterostructures grown on a standard Si(001) substrate Myronov M, Morrison C, Halpin J, Rhead S, Foronda J, Leadley D |
40 - 43 |
Low-temperature reduction of Ge oxide by Si and SiH4 in low-pressure H-2 and Ar environment Minami K, Moriya A, Yuasa K, Maeda K, Yamada M, Kunii Y, Niwano M, Murota J |
44 - 48 |
Epitaxial formation of Ni germanide on Ge(001) substrate by reactive deposition Deng Y, Nakatsuka O, Suzuki A, Sakashita M, Zaima S |
49 - 53 |
Epitaxial growth and crystalline properties of Ge1-x-ySixSny on Ge(001) substrates Asano T, Terashima T, Yamaha T, Kurosawa M, Takeuchi W, Taoka N, Nakatsuka O, Zaima S |
54 - 58 |
Effect of Sn on crystallinity and electronic property of low temperature grown polycrystalline-Si1-x-yGexSny layers on SiO2 Yamaha T, Kurosawa M, Ohmura T, Takeuchi W, Taoka N, Nakatsuka O, Zaima S |
59 - 64 |
Vertical Ge and GeSn heterojunction gate-all-around tunneling field effect transistors Schulze J, Blech A, Datta A, Fischer IA, Hahnel D, Naasz S, Rolseth E, Tropper EM |
65 - 70 |
Electrical characterization of p-GeSn/n-Ge diodes with interface traps under dc and ac regimes Baert B, Gupta S, Gencarelli F, Loo R, Simoen E, Nguyen ND |
71 - 75 |
Absorption coefficients of GeSn extracted from PIN photodetector response Ye K, Zhang W, Oehme M, Schmid M, Gollhofer M, Kostecki K, Widmann D, Korner R, Kasper E, Schulze J |
76 - 82 |
Compositional dependence of optical interband transition energies in GeSn and GeSiSn alloys Xu C, Senaratne CL, Kouvetakis J, Menendez J |
83 - 85 |
Enhanced light emission from Ge by GeO2 micro hemispheres Chen YY, Yen CC, Chang TY, Liu CW |