화학공학소재연구정보센터

Solid-State Electronics

Solid-State Electronics, Vol.53, No.10 Entire volume, number list
ISSN: 0038-1101 (Print) 

In this Issue (15 articles)

1059 - 1062 The split-gate flash memory with an extra select gate for automotive applications
Tsair YS, Fang YK, Wang YH, Chu WT, Hsieh CT, Lin YT, Wang CS, Wong MR, Lee S, Smolen R, Liu B
1063 - 1066 Stability of PMMA on P3HT PTFTs under stress
Estrada M, Mejia I, Cerdeira A, Pallares J, Marsal LF, Iniguez B
1067 - 1075 Comparative analysis of unity gain frequency of top and bottom-contact organic thin film transistors
Islam MN, Mazhari B
1076 - 1085 Method of extracting effective channel length for nano-scale n-MOSFETs
Choi HW, Lee NH, Kang HS, Kang BK
1086 - 1091 Thermal analysis of asymmetric intracavity-contacted oxide-aperture VCSELs for efficient heat dissipation
Lee HK, Song YM, Lee YT, Yu JS
1092 - 1098 A study of gateless OTP cell using a 45 nm CMOS compatible process
Tsai YH, Lin KC, Chiu HY, Shih HS, King YC, Lin CJ
1099 - 1102 Effect of nano-patterning of p-GaN cladding layer on photon extraction efficiency
Hong EJ, Byeon KJ, Park H, Hwang J, Lee H, Choi K, Kim HS
1103 - 1106 Technological dispersion in CNTFET: Impact of the presence of metallic carbon nanotubes in logic circuits
Fregonese S, Maneux C, Zimmer T
1107 - 1111 Thickness-dependent threshold voltage in polycrystalline pentacene-based thin-film transistors
Wang YW, Cheng HL
1112 - 1115 Optimum location of silicide/Si interface in ultra-thin body SOI MOSFETs with recessed and elevated silicide source/drain contact structure
Kim SD
1116 - 1125 Preparation and characterization of solid n-TiO2/p-NiO hetrojunction electrodes for all-solid-state dye-sensitized solar cells
Lee YM, Lai CH
1126 - 1129 Impact of electrostatics and doping concentration on the performance of silicon tunnel field-effect transistors
Sandow C, Knoch J, Urban C, Zhao QT, Mantl S
1130 - 1134 Multiband simulation of quantum transport in nanoscale double-gate MOSFETs
Iwata H, Matsuda T, Ohzone T
1135 - 1143 Strain relaxation mechanisms in compositionally uniform and step-graded SiGe films grown on Si(110) substrates
Arimoto K, Watanabe M, Yamanaka J, Nakagawa K, Sawano K, Shiraki Y, Usami N, Nakajima K
1144 - 1148 Finite element simulation of metal-semiconductor-metal photodetector
Guarino G, Donaldson WR, Mikulics M, Marso M, Kordos P, Sobolewski R