1059 - 1062 |
The split-gate flash memory with an extra select gate for automotive applications Tsair YS, Fang YK, Wang YH, Chu WT, Hsieh CT, Lin YT, Wang CS, Wong MR, Lee S, Smolen R, Liu B |
1063 - 1066 |
Stability of PMMA on P3HT PTFTs under stress Estrada M, Mejia I, Cerdeira A, Pallares J, Marsal LF, Iniguez B |
1067 - 1075 |
Comparative analysis of unity gain frequency of top and bottom-contact organic thin film transistors Islam MN, Mazhari B |
1076 - 1085 |
Method of extracting effective channel length for nano-scale n-MOSFETs Choi HW, Lee NH, Kang HS, Kang BK |
1086 - 1091 |
Thermal analysis of asymmetric intracavity-contacted oxide-aperture VCSELs for efficient heat dissipation Lee HK, Song YM, Lee YT, Yu JS |
1092 - 1098 |
A study of gateless OTP cell using a 45 nm CMOS compatible process Tsai YH, Lin KC, Chiu HY, Shih HS, King YC, Lin CJ |
1099 - 1102 |
Effect of nano-patterning of p-GaN cladding layer on photon extraction efficiency Hong EJ, Byeon KJ, Park H, Hwang J, Lee H, Choi K, Kim HS |
1103 - 1106 |
Technological dispersion in CNTFET: Impact of the presence of metallic carbon nanotubes in logic circuits Fregonese S, Maneux C, Zimmer T |
1107 - 1111 |
Thickness-dependent threshold voltage in polycrystalline pentacene-based thin-film transistors Wang YW, Cheng HL |
1112 - 1115 |
Optimum location of silicide/Si interface in ultra-thin body SOI MOSFETs with recessed and elevated silicide source/drain contact structure Kim SD |
1116 - 1125 |
Preparation and characterization of solid n-TiO2/p-NiO hetrojunction electrodes for all-solid-state dye-sensitized solar cells Lee YM, Lai CH |
1126 - 1129 |
Impact of electrostatics and doping concentration on the performance of silicon tunnel field-effect transistors Sandow C, Knoch J, Urban C, Zhao QT, Mantl S |
1130 - 1134 |
Multiband simulation of quantum transport in nanoscale double-gate MOSFETs Iwata H, Matsuda T, Ohzone T |
1135 - 1143 |
Strain relaxation mechanisms in compositionally uniform and step-graded SiGe films grown on Si(110) substrates Arimoto K, Watanabe M, Yamanaka J, Nakagawa K, Sawano K, Shiraki Y, Usami N, Nakajima K |
1144 - 1148 |
Finite element simulation of metal-semiconductor-metal photodetector Guarino G, Donaldson WR, Mikulics M, Marso M, Kordos P, Sobolewski R |