1051 - 1051 |
SELECTED PAPERS FROM ISDRS 2009 - Foreword Iliadis AA, Akturk A |
1052 - 1059 |
Application of a novel test system to characterize single-event effects at cryogenic temperatures Ramachandran V, Gadlage MJ, Ahlbin JR, Narasimham B, Alles ML, Reed RA, Bhuva BL, Massengill LW, Black JD, Foster CN |
1060 - 1065 |
Design of SOI FinFET on 32 nm technology node for low standby power (LSTP) operation considering gate-induced drain leakage (GIDL) Cho S, Lee JH, O'uchi S, Endo K, Masahara M, Park BG |
1066 - 1070 |
Three-color photodetector based on quantum dots and resonant-tunneling diodes coupled with conductive polymers Liao SC, Sun K, Dutta M, Stroscio MA |
1071 - 1075 |
Epitaxial graphene top-gate FETs on silicon substrates Kang HC, Karasawa H, Miyamoto Y, Handa H, Fukidome H, Suemitsu T, Suemitsu M, Otsuji T |
1076 - 1082 |
Atomic layer deposited high-k nanolaminate capacitors Smith SW, McAuliffe KG, Conley JF |
1083 - 1087 |
Analytical modeling of the gate tunneling leakage for the determination of adequate high-k dielectrics in double-gate SOI MOSFETs at the 22 nm node Darbandy G, Ritzenthaler R, Lime F, Garduno I, Estrada M, Cerdeira A, Iniguez B |
1088 - 1093 |
The spatial origin of current noise in semiconductor devices in the framework of semiclassical transport Korman CE, Noaman BA |
1094 - 1097 |
Electrical characteristics of SiGe channel MOS devices with high-k/metal gate incorporated with nitrogen by plasma immersion ion implantation Fu CH, Chang-Liao KS, Du LW, Wang TK, Tsai WF, Ai CF |
1098 - 1104 |
Self-aligned ALD AlOx T-gate insulator for gate leakage current suppression in SiNx-passivated AlGaN/GaN HEMTs Meyer DJ, Bass R, Katzer DS, Deen DA, Binari SC, Daniels KM, Eddy CR |
1105 - 1112 |
High-temperature modeling of AlGaN/GaN HEMTs Vitanov S, Palankovski V, Maroldt S, Quay R |
1113 - 1118 |
Improvement on programming and erasing speeds for charge-trapping flash memory device with SiGe buried channel Liu LJ, Chang-Liao KS, Keng WC, Wang TK |
1119 - 1124 |
Current injection efficiency induced efficiency-droop in InGaN quantum well light-emitting diodes Zhao HP, Liu GY, Arif RA, Tansu N |
1125 - 1129 |
Ultrafast nonlinear optical effects in semiconductor quantum wells resonantly driven by strong few-cycle terahertz pulses Tomaino JL, Jameson AD, Lee YS, Prineas JP, Steiner JT, Kira M, Koch SW |
1130 - 1134 |
Characterization of nanometer scale compositionally inhomogeneous AlGaN active regions on bulk AlN substrates Sampath AV, Garrett GA, Readinger ED, Enck RW, Shen H, Wraback M, Grandusky JR, Schowalter LJ |
1135 - 1142 |
A toggle MRAM bit modeled in Verilog-A Engelbrecht LM, Jander A, Dhagat P, Hall M |
1143 - 1149 |
ZnO nanobridge devices fabricated using carbonized photoresist Pelatt BD, Huang CC, Conley JF |
1150 - 1154 |
Crystal quality and conductivity type of (002) ZnO films on (100) Si substrates for device applications Sardari SE, Iliadis AA, Stamataki M, Tsamakis D, Konofaos N |
1155 - 1159 |
Effects of fin width on memory windows in FinFET ZRAMs Zhang EX, Fleetwood DM, Alles ML, Schrimpf RD, Mamouni FE, Xiong W, Cristoloveanu S |
1160 - 1165 |
High work function metal gate and reliability improvement for MOS device by integration of TiN/MoN and HfAlO dielectric Fu CH, Chang-Liao KS, Lu HY, Li CC, Wang TK |
1166 - 1172 |
Design considerations for integration of Horizontal Current Bipolar Transistor (HCBT) with 0.18 mu m bulk CMOS technology Koricic M, Suligoj T, Mochizuki H, Morita S, Shinomura K, Imai H |
1173 - 1184 |
Reliable procedure for electrical characterization of MOS-based devices Dobes J, Michal J, Panko V, Pospisil L |
1185 - 1191 |
Facile pyrolytic synthesis of silicon nanowires Chan JC, Tran H, Pattison JW, Rananavare SB |
1192 - 1196 |
A high efficient, low power, and compact charge pump by vertical MOSFETs Sakui K, Endoh T |
1197 - 1203 |
Charge trapping and current-conduction mechanisms of metal-oxide-semiconductor capacitors with LaxTay dual-doped HfON dielectrics Cheng CL, Horng JH, Chang-Liao KS, Jeng JT, Tsai HY |
1204 - 1210 |
Controlled growth, patterning and placement of carbon nanotube thin films Sangwan VK, Ballarotto VW, Hines DR, Fuhrer MS, Williams ED |
1211 - 1215 |
Implementation of E-Beam Proximity Effect Correction using linear programming techniques for the fabrication of asymmetric bow-tie antennas Yesilkoy F, Choi K, Dagenais M, Peckerar M |
1216 - 1220 |
A SiGe/Si multiple quantum well avalanche photodetector Sun PH, Chang ST, Chen YC, Lin HC |
1221 - 1226 |
Nonpolar growth and characterization of a-plane InGaN/GaN quantum well structures with different indium compositions Song H, Kim JS, Kim EK, Lee SH, Kim JB, Son JS, Hwang SM |
1227 - 1231 |
Si implant-assisted Ohmic contacts to GaN Nguyen C, Shah P, Leong E, Derenge M, Jones K |
1232 - 1237 |
The benefits and current progress of SiC SGTOs for pulsed power applications Ogunniyi A, O'Brien H, Lelis A, Scozzie C, Shaheen W, Agarwal A, Zhang J, Callanan R, Temple V |