1881 - 1895 |
RF MOSFET: recent advances, current status and future trends Liou JJ, Schwierz F |
1897 - 1901 |
Terahertz self-oscillations in negative-effective-mass oscillators Cao JC, Lei XL, Liu HC |
1903 - 1907 |
Electronic effects of light ion damage in hydrogenated amorphous silicon Shannon JM, Chua CH |
1909 - 1915 |
A unified I-V model for PD/FD SOI MOSFETs with a compact model for floating body effects Bolouki S, Maddah M, Afzali-Kusha A, El Nokali M |
1917 - 1920 |
Device simulations of nanocrystalline silicon thin-film transistors Dosev D, Iniguez B, Marsal LF, Pallares J, Ytterdal T |
1921 - 1926 |
Computational load pull simulations of SiC microwave power transistors Jonsson R, Wahab Q, Rudner S, Svensson C |
1927 - 1936 |
Substrate loss mechanisms for microstrip and CPW transmission lines on lossy silicon wafers Lederer D, Raskin JP |
1937 - 1941 |
A high performance RF LDMOSFET in thin film SOI technology with step drift profile Luo J, Cao G, Madathil SNE, De Souza MM |
1943 - 1952 |
Sub-circuit models of silicon-on-insulator insulated-gate pn junction devices for electrostatic discharge protection circuit design and their applications Wakita S, Omura Y |
1953 - 1958 |
A new procedure to extract the threshold voltage of MOSFETs using noise-reduction techniques Picos R, Roca M, Iniguez B, Garcia-Moreno E |
1959 - 1967 |
A review of leakage current in SOICMOS ICs: impact on parametric testing techniques Iniguez B, Raskin JP, Simon P, Flandre D, Segura J |
1969 - 1972 |
Application of advanced metal-oxide-semiconductor transistor in next generation, silicon resonant tunneling MOS transistor, to new logic circuit Matsuo N, Kihara H, Takami Y |
1973 - 1981 |
Defect spectroscopy using 1/f(gamma) noise of gate leakage current in ultrathin oxide MOSFETs Lee J, Bosman G |
1983 - 1987 |
A model for multi-finger HBTs including current gain collapse effects Garlapati A, Prasad S, Vempada P, Munshi K |
1989 - 1994 |
Temperature effects of low noise InGaP/InGaAs/GaAs PHEMTs Huang HK, Wang CS, Wang YH, Wu CL, Chang CS |
1995 - 2000 |
Hafnium oxide gate dielectric for strained-Si1-xGex Maiti CK, Maikap S, Chatterjee S, Nandi SK, Samanta SK |
2001 - 2010 |
Ohmic contact properties of Ni/C film on 4H-SiC Lu WJ, Mitchel WC, Landis GR, Crenshaw TR, Collins WE |
2011 - 2014 |
Elimination of burn-in effect in carbon-doped InGaP/GaAs HBTs by hydrogen lateral diffusion Su YK, Chen WB, Lin CL, Wang HC, Chen SM, Liang KM |
2015 - 2018 |
A fully integrated dual-band VCO by 0. 18 mu m CMOS technologies Ho CC, Kuo CW, Hisao CC, Chan YJ |
2019 - 2022 |
Nitride-based blue LEDs with GaN/SiN double buffer layers Kuo CH, Chang SJ, Su YK, Wang CK, Wu LW, Sheu JK, Wen TC, Lai WC, Tsai JM, Lin CC |
2023 - 2026 |
Nitride-based 2DEG photodetectors with a large AC responsivity Chang SJ, Kuan TM, Ko CH, Su YK, Webb JB, Bardwell JA, Liu Y, Tang H, Lin WJ, Cherng YT, Lan WH |
2027 - 2030 |
In0.23Ga0.77N/GaN MQW LEDs with a low temperature GaN cap layer Wu LW, Chang SJ, Su YK, Chuang RW, Hsu YP, Kuo CH, Lai WC, Wen TC, Tsai JM, Sheu JK |
2031 - 2034 |
Effect of substituted derivatives on carrier transport in organic polymers Kwok HHL |
2035 - 2041 |
Ohmic contacts to 3C-SiC for Schottky diode gas sensors Roy S, Jacob C, Basu S |
2043 - 2048 |
A unified model for high-frequency current noise of MOSFETs Teng HF, Jang SL, Juang MH |
2049 - 2053 |
Optimization of plasma nitridation for reliability enhancement of low-temperature gate dielectric in MOS devices Or DCT, Lai PT, Sin JKO |
2055 - 2061 |
Random doping-induced fluctuations of subthreshold characteristics in MOSFET devices Andrei P, Mayergoyz I |
2063 - 2066 |
A novel integrable surface acoustic wave notch filter Tang IT, Chen HJ, Houng MP, Wang YH |
2067 - 2074 |
Exact analytical solution of channel surface potential as an explicit function of gate voltage in undoped-body MOSFETs using the Lambert W function and a threshold voltage definition therefrom Ortiz-Conde A, Sanchez FJG, Guzman M |
2075 - 2080 |
DC electric field assisted alignment of carbon nanotubes on metal electrodes Kumar MS, Lee SH, Kim TY, Kim TH, Song SM, Yang JW, Nahm KS, Suh EK |
2081 - 2084 |
Quasi-enhancement mode AlGaN/GaN HEMTs on sapphire substrate Lee J, Liu DM, Lin ZJ, Lu W, Flynn JS, Brandes GR |
2085 - 2088 |
Fabrication of indium resistors by layer-by-layer nanoassembly and microlithography techniques Shi JS, Cui TH |
2089 - 2095 |
A 2D-electron-gas terahertz detector based on the bipolar inversion channel field-effect transistor Huo Y, Taylor GW |
2097 - 2103 |
Effect of surface passivation on performance of AlGaN/GaN/Si HEMTs Bernat J, Javorka P, Fox A, Marso M, Luth H, Kordos P |
2105 - 2111 |
Very low Schottky barrier to n-type silicon with PtEr-stack silicide Tang XH, Katcki J, Dubois E, Reckinger N, Ratajczak J, Larrieu G, Loumaye P, Nisole O, Bayot V |
2113 - 2116 |
Thermal resistance variation of HBT with high junction temperature and bias condition Su YK, Wei SC, Chang LS, Wang RL, Wang CJ |
2117 - 2125 |
Explicit current model for dual-gate MOSFET Karahaliloglu K, Dundar G |
2127 - 2130 |
Optoelectronic property of PN junction on erbium-doped silicon using thermal diffusion method Bing RC, Yuan YZ, Bo Y |
2131 - 2134 |
Modeling and simulation of asymmetric gate stack (ASYMGAS)-MOSFET Saxena M, Haldar S, Gupta M, Gupta RS |
2135 - 2137 |
Computationally efficient solution of carrier trapping/annihilation equation in MOS devices using Runge-Kutta method Samanta P, Sarkar CK |