2097 - 2100 |
npn AlGaN/GaN heterojunction bipolar transistors and GaN bipolar junction transistors with regrown C-doped GaAs in the base regions Dang G, Luo B, Zhang AP, Cao XA, Ren F, Pearton SJ, Cho H, Hobson WS, Lopata J, van Hove JM, Klaassen JJ, Polley CJ, Wowchack AM, Chow PP, King DJ |
2101 - 2108 |
The effect of N-2 plasma damage on AlGaAs/InGaAs/GaAs high electron mobility transistors. I. DC characteristics Trivedi VP, Hsu CH, Luo B, Cao X, LoRache JR, Ren F, Pearton SJ, Abernathy CR, Lambers E, Hoppe M, Wu CS, Sasserath J, Lee JW, Mackenzie K |
2109 - 2116 |
An analytical model for punch-through limited breakdown voltage of planar junction with multiple floating field limiting rings Bae DG, Chung SK |
2117 - 2122 |
Processing techniques for InGaAs/InAlAs/InGaAs spin field effect transistors LaRoche JR, Ren F, Temple D, Pearton SJ, Kuo JM, Baca AG, Cheng P, Park YD, Hudspeth Q, Hebard AF, Arnason SB |
2123 - 2129 |
Effects of distance between wells on band structure and characteristics of InGaAs/InGaAsP strain-compensated multiple quantum well lasers Ma CS, Wang LJ, Liu SY |
2131 - 2138 |
Optimization of vertical 600 and 1500 VSOI-ESTs with low on-state voltages Steck B, Vogt H |
2139 - 2146 |
Temperature-dependence of steady-state characteristics of SCR-type ESD protection circuits Jang SL, Lin JK |
2147 - 2153 |
The time-frequency analysis approach of electric noise based on the wavelet transform Dai YS |
2155 - 2159 |
Turn-off operation of a MOS-gate 2.6 kV 4H-SiC gate turn-off thyristor Ivanov PA, Levinshtein ME, Rumyantsev SL, Agarwal AK, Palmour JW |
2161 - 2164 |
Optical response of planar Mo/n-Si/Mo structures with long neutral region and Schottky barriers at both ends Takano H, Kimura M, Ando T, Niemcharoen S, Yasumura Y, Sato K |
2165 - 2170 |
Design optimization of stacked layer dielectrics for minimum gate leakage currents Zhang J, Yuan JS, Ma Y, Oates AS |
2171 - 2176 |
Equivalent junction transformation: a semi-empirical analytical method for predicting the breakdown characteristics of cylindrical- and spherical-abrupt PN junctions He J, Zhang X, Huang R, Wang YY |
2177 - 2182 |
Reproducibility of growing AlGaN/GaN high-electron-mobility-transistor heterostructures by molecular-beam epitaxy Tang H, Webb JB, Bardwell JA, Rolfe S, MacElwee T |
2183 - 2191 |
An analysis of process fluctuation induced propagation delay variation using analytical model Shigyo N |
2193 - 2198 |
The effect of hydrostatic pressure on the electronic and optical properties of InP Bouarissa N |
2199 - 2205 |
Modeling of the body current in a Bi-MOS hybrid-mode environment Yeo KS, Seah SHL, Ma JG, Do MA |
2207 - 2212 |
A silicon quantum wire transistor with one-dimensional subband effects Je M, Han S, Kim I, Shin H |
2213 - 2216 |
Estimation for the capture cross-sections of surface state on p-Si surface by photovoltaic method Yan YM |
2217 - 2223 |
Ballistic electron emission microscopy studies of the temperature dependence of Schottky barrier height distribution in CoSi2/n-Si(100) diodes formed by solid phase reaction Zhu SY, Qu XP, Van Meirhaeghe RL, Detavernier C, Ru GP, Cardon F, Li BZ |
2225 - 2232 |
Electrical, structural, and optical characterization of free-standing GaN template grown by hydride vapor phase epitaxy Yun F, Reshchikov MA, Jones K, Visconti P, Morkoc H, Park SS, Lee KY |
2233 - 2237 |
A new way for measuring the apparent band gap narrowing in bipolar transistors Haiyan J, Lichun Z |
2239 - 2246 |
Simulation study of high injection effects and parasitic barrier formation in SiGeHBTs operating at high current densities Mushini P, Roenker KP |
2247 - 2252 |
Can molecular resonant tunneling diodes be used for local refresh of DRAM memory cells? Berg J, Bengtsson S, Lundgren P |
2253 - 2257 |
Analytical expression for ion-implanted impurity concentration profiles Suzuki K, Sudo R |
2259 - 2264 |
Self-aligned silicon-on-insulator nano flash memory device Tang X, Baie X, Colinge JP, Crahay A, Katschmarsyj B, Scheuren V, Spote D, Reckinger N, Van de Wiele F, Bayot V |
2265 - 2271 |
Simulation study of the DC and AC characteristics of an a-Si : H(n)/GaAs(p)/CaAs(n) heterojunction bipolar transistor Della Corte FG |