301 - 308 |
A compact and accurate MOSFET model with simple expressions for linear, saturation and sub-threshold regions Katto H |
309 - 315 |
Band-to-band tunneling induced substrate hot electron injection (BBISHE) to perform programming for NOR flash memory Wu MY, Dai SH, Lee KH, Hu SF, King YC |
316 - 321 |
Gate leakage and electrical performance of AlGaN/GaN MIS-type HFET with evaporated silicon oxide layer Kikuta D, Ao JP, Ohno Y |
322 - 326 |
Thin film Lamb wave resonant structures - The first approach Bjurstrom J, Yantchev V, Katardjiev I |
327 - 332 |
Analytical model for base transit time of a bipolar transistor with Gaussian-doped base Hassan MMS, Rahman T, Khan MZR |
333 - 339 |
Characterization of silicon-germanium heterojunction bipolar transistors degradation in silicon-germanium BiCMOS technologies Lee SY, Park CW |
340 - 344 |
Noise spectroscopy of localized states in Au/n-GaAs Schottky diodes containing InAs quantum dots Tsormpatzoglou A, Tassis DH, Dimitriadis CA, Kamarinos G, Frigeri P, Franchi S, Gombia E, Mosca R |
345 - 354 |
An analysis of the factors affecting the alpha parameter used for extracting surface recombination velocity in EBIC measurements Kurniawan O, Ong VKS |
355 - 361 |
Transport mechanisms and photovoltaic characteristics of p-SxSe100-x/n-Si heterojunctions El-Nahass MM, El-Sayed HEA, El-Barry AMA |
362 - 366 |
Transient processes in a Ge/Si hetero-nanocrystal p-channel memory Zhao DT, Zhu Y, Li RG, Liu JL |
367 - 371 |
Observation of negative capacitance in a-SiC : H/a-Si : H UV photodetectors Gharbi R, Abdelkrim M, Fathallah M, Tresso E, Ferrero S, Pirri CF, Brahim TM |
372 - 377 |
Study of surface-trap-induced gate depletion region of field-modulating plate GaAs-FETs Wakejima A, Ota K, Matsunaga K |
378 - 383 |
Analysis of Schottky barrier source-gated transistors in a-Si : H Balon F, Shannon JM |
384 - 387 |
DC characterization of 4H-SiC depletion mode MOS field effect transistor Zhao P, Rusli, Zhu CL, Wang H, Tin CC |
388 - 398 |
Physics-based modeling and characterization for silicon carbide power diodes McNutt TR, Hefner AR, Mantooth HA, Duliere JL, Berning DW, Singh R |
399 - 407 |
Implementation of a scalable VBIC model for SiGe : C HBTs Chakravorty A, Scholz RF, Knoll D, Fox A, Senapati B, Maiti CK |
408 - 411 |
Effective temperature measurements of AlGaN/GaN-based HEMT under various load lines using micro-Raman technique Kim J, Freitas JA, Mittereder J, Fitch R, Kang BS, Pearton SJ, Ren F |
412 - 415 |
Optimum bias of power transistor in 0.18 mu m CMOS technology for Bluetooth application Hsu HM, Lee TH |
416 - 421 |
A carrier-based analytic DCIV model for long channel undoped cylindrical surrounding-gate MOSFETs He J, Zhang X, Zhang GG, Chan MS, Wang YY |
422 - 428 |
A new model for four-terminal junction field-effect transistors Ding H, Liou JJ, Green K, Cirba CR |
429 - 432 |
Pd/Pt/Au ohmic contact for AlSb/InAs0.7Sb0.3 heterostructures Robinson JA, Mohney SE, Boos JB, Tinkham BP, Bennett BR |
433 - 436 |
New contact resistivity characterization method for non-uniform ohmic contacts on GaN Jang T, Kwak JS, Nam OH, Park Y |
437 - 447 |
Engineering source/drain extension regions in nanoscale double gate (DG) SOI MOSFETs: Analytical model and design considerations Kranti A, Armstrong GA |
448 - 455 |
Analytical model of drain current of strained-Si/strained-Si1-yGey/relaxed-Si1-xGex NMOSFETs and PMOSFETs for circuit simulation Bindu B, DasGupta N, DasGupta A |
456 - 459 |
An analytical model of Monte Carlo electron scattering in ZnS He QF, Xu Z, Liu DA, Xu XR |
460 - 467 |
Amorphous silicon carbide TFTs Estrada M, Cerdeira A, Resendiz L, Garcia R, Iniguez B, Marsal LF, Pallares J |
468 - 472 |
Investigation of InP/InGaAs pnp delta-doped heterojunction bipolar transistor with extremely low offset voltage Tsai JH, Kang YC, Hsu IH, Weng TY |
473 - 479 |
Numerical analysis of an optoelectronic integrated device composed of coupled periodic MQW phototransistor and strained-QW laser diode Darabi E, Ahmadi V, Mirabbaszadeh K |
480 - 488 |
Influence of the minority carrier extracted by the base electrode on current gain of bipolar power transistors Zhang B, Chen WJ, Yi K, Li ZJ |
489 - 495 |
An improved substrate current model for ultra-thin gate oxide MOSFETs Yang LA, Hao Y, Yu CL, Han FY |
496 - 499 |
Modelling of strained-Si/SiGe NMOS transistors including DC self-heating Jankovic ND, Pesic TV, O'Neill A |
500 - 503 |
Transparent ring oscillator based on indium gallium oxide thin-film transistors Presley RE, Hong D, Chiang HQ, Hung CM, Hoffman RL, Wager JF |
504 - 507 |
One-step hydrothermal synthesis and gas sensing property of ZnSnO3 microparticles Xu JQ, Jia XH, Lou XD, Shen JN |
508 - 510 |
The silicon oxynitride layer deposited at low temperature for high-brightness GaN-based light-emitting diodes Da XL, Guo X, Dong LM, Song YP, Ai WW, Shen GD |
511 - 513 |
High temperature performance of AlGaN/GaN HEMTs on Si substrates Tan WS, Uren MJ, Fry PW, Houston PA, Balmer RS, Martin T |