627 - 632 |
Mesostructured SnO2 as sensing material for gas sensors Wang Y, Wu XH, Li YF, Zhou ZL |
633 - 640 |
Red hybrid organic light-emitting device fabricated with molecularly doped polyimide thin film containing hole-transporting nanoparticles Kim YK, Lim HT, Ha CS |
641 - 654 |
Influence of magnetic field on 1/f noise and thermal noise in multi-terminal homogeneous semiconductor resistors and discrimination between the number fluctuation model and the mobility fluctuation model for 1/f noise in bulk semiconductors Kim YS, Yun SS, Park CH, Min HS, Park YJ |
655 - 667 |
Study of improved reverse recovery in power transistor incorporating universal contact Anand RS, Mazhari B, Narain J |
669 - 674 |
Extrinsic parameter extraction and RF modelling of CMOS Alam MS, Armstrong GA |
675 - 681 |
Gate capacitance characteristics of a poly-Si thin film transistor Bindra S, Haldar S, Gupta RS |
683 - 688 |
Boundary conditions for realistic simulation of ultra short pseudomorphic high electron mobility transistor on indium phosphide substrates Medjdoub F, Dessenne F, Thobel JL, Zaknoune M, Theron D |
689 - 695 |
Thermal annealing effects on Ni/Au based Schottky contacts on n-GaN and AlGaN/GaN with insertion of high work function metal Miura N, Nanjo T, Suita M, Oishi T, Abe Y, Ozeki T, Ishikawa H, Egawa T, Jimbo T |
697 - 704 |
Impact of metallisation on resistor matching in a 0.35 mu m analogue CMOS process Lowe A |
705 - 714 |
The super junction bipolar transistor: a new silicon power device concept for ultra low loss switching applications at medium to high voltages Bauer FD |
715 - 719 |
A theoretical study on stress sensitive differential amplifier (SSDA) Li JJ, Yue RF, Liu LT |
721 - 729 |
Quantifying hole mobility degradation in pMOSFETs with a strained-Si0.7Ge0.3 surface-channel under an ALD TiN/Al2O3/HfAlOx/Al2O3 gate stack Persson S, Wu D, Hellstrom PE, Zhang SL, Ostling M |
731 - 737 |
Impact of oxide damage on the light emission properties of MOS tunnel structures Asli N, Shulekin AF, Yoder PD, Vexler MI, Grekhov IV, Seegebrecht P |
739 - 745 |
Electrical characterization of 12 nm EJ-MOSFETs on SOI substrates Henschel W, Wahlbrink T, Georgiev YM, Lemme M, Mollenhauer T, Vratzov B, Fuchs A, Kurz H, Kittler M, Schwierz F |
747 - 758 |
Short-channel effects in the Lorentzian noise induced by the EVB tunneling in partially-depleted SOI MOSFETs Lukyanchikova N, Garbar N, Smolanka A, Simoen E, Mercha A, Claeys C |
759 - 763 |
Thermal noise in RF CMOS mixers Tong KY, Ma BK, Yuen HT |
765 - 772 |
Hot carrier quasi-ballistic transport in semiconductor devices Childs PA, Dyke DW |
773 - 779 |
A physics based model for accumulation MOS capacitors Otin A, Celma S, Aldea C |
781 - 787 |
Accounting for quantum mechanical effects from accumulation to inversion, in a fully analytical surface-potential-based MOSFET model Pregaldiny F, Lallement C, Mathiot D |
789 - 797 |
Simulation and modeling of the substrate contribution to the output resistance for RF-LDMOS power transistors Ankarcrona J, Eklund KH, Vestling L, Olsson J |
799 - 805 |
Analytical models for the surface potential and electrical field distribution of bulk-silicon RESURF devices Sun WF, Shi LX |
807 - 811 |
Steady-state and transient characteristics of 10 kV 4H-SiC diodes Levinshtein ME, Mnatsakanov TT, Ivanov PA, Singh R, Palmour JW, Yurkov SN |
813 - 825 |
Noise modeling in fully depleted SOI MOSFETs Pailloncy G, Iniguez B, Dambrine G, Raskin JP, Danneville F |
827 - 830 |
Si+ ion implanted MPS bulk GaN diodes Irokawa Y, Kim J, Ren F, Baik KH, Gila BP, Abernathy CR, Pearton SJ, Pan CC, Chen GT, Chyi JI, Park SS |
831 - 836 |
The effect of imaging forces in ultra thin gate insulator on the tunneling current and its oscillations at the region of transition from the direct tunneling to the Fowler-Nordheim tunneling Goldman EI, Kukharskaya NF, Zhdan AG |
837 - 840 |
SiGe resonance phase transistor: active transistor operation beyond the transit frequency f(T) Kasper E, Eberhardt J, Jorke H, Luy JF, Kibbel H, Dashiell MW, Schmidt OG, Stoffel M |
841 - 844 |
A fast experimental method to measure the current-voltage characteristics of metal/semiconductor interfaces Centurioni E |
845 - 849 |
Comparative I(V) study of pure Schottky contacts used in spin-LEDs Bobo JF, Couderc S, Arnoult A, Fontaine C, Mamy R |
851 - 854 |
Gateless AlGaN/GaN HEMT response to block co-polymers Kang BS, Louche G, Duran RS, Gnanou Y, Pearton SJ, Ren F |