777 - 783 |
Evaluation of rapid thermal processing systems for use in CMOS fabrication Trivedi V, Pearton SJ |
785 - 789 |
Tunnel diode collector contact in InP based PNP heterojunction bipolar transistors Shamir N, Ritter D, Cytermann C |
791 - 795 |
Response surface methodology applied to silicon trench etching in Cl-2/HBr/O-2 using transformer coupled plasma technique Hung CC, Lin HC, Shih HC |
797 - 801 |
Orientation and dielectric overlayer effects in InGaP/GaAs heterojunction bipolar transistors Baca AG, Monier C, Chang PC, Briggs RD, Armendariz MG, Pearton SJ |
803 - 806 |
Influence of SiO2PECVD layers on p-GaN rectifiers Baik KH, Luo B, Pearton SJ, Ren F |
807 - 817 |
On-voltage analysis of a forward-biased pn-junction: an interconnect model for CMOS device simulation Yamaguchi K |
819 - 826 |
Compact representation of temperature and power dependence of thermal resistance in Si, Inp and GaAs substrate devices using linear models Walkey DJ, Smy TJ, Macelwee T, Maliepaard M |
827 - 835 |
The influence of band offsets on the IV characteristics for GaN/SiC heterojunctions Danielsson E, Zetterling CM, Ostling M, Linthicum K, Thomson DB, Nam OH, Davis RF |
837 - 845 |
Electron and hole trapping in the bulk and interface with Si of a thermal oxide grown on the sidewalls and base of a U-shaped silicon trench Suliman SA, Awadelkarim OO, Fonash SJ, Ridley RS, Dolny GM, Hao J, Knoedler CM |
847 - 851 |
Optimum design of punch-through junction used in bipolar and unipolar high voltage power devices He J, Zhang X, Wang YY, Xi XM |
853 - 857 |
A physics-based model for the substrate resistance of MOSFETs Gao XF, Liou JJ, Ortiz-Conde A, Bernier J, Croft G |
859 - 866 |
Sensitivity analysis of two-spectrum separation of surface and bulk components of minority carrier lifetimes Brody J, Rohatgi A |
867 - 876 |
Doping induced design considerations for InP/In0.53Ga0.47As heterojunction bipolar transistors Mohammad SN |
877 - 883 |
InGaAs/InP single quantum well structure grown on GaAs substrate with linearly graded metamorphic InGaP buffer layer by solid source molecular beam epitaxy Radhakrishnan K, Yuan K, Zheng HQ |
885 - 889 |
Depletion lengths in semiconductor nanostructures Luscombe JH, Frenzen CL |
891 - 901 |
Determination of parameters of radiation induced traps in silicon Siemieniec R, Sudkamp W, Lutz J |
903 - 909 |
Striped anode engineering: a concept for fast switching power devices Luther-King N, Sweet M, Spulber O, Vershinin K, De Souza MM, Narayanan EMS |
911 - 913 |
1.6 A GaN Schottky rectifiers on bulk GaN substrates Johnson JW, Lou B, Ren F, Palmer D, Pearton SJ, Park SS, Park YJ, Chyi JI |
915 - 923 |
A hydrodynamic equivalent circuit model for the Gunn diode Kao CH, Chen LW |
925 - 932 |
Dynamic finite element approach for analyzing stress and distortion in multilevel devices Lakhsasi A, Skorek A |
933 - 936 |
GaN pnp bipolar junction transistors operated to 250 degrees C Zhang AP, Dang G, Ren F, Han J, Monier C, Baca AG, Cao XA, Cho H, Abernathy CR, Pearton SJ |