865 - 870 |
Hooge noise parameter of epitaxial n-GaN on sapphire Tanuma N, Tacano M, Pavelka J, Hashiguchi S, Sikula J, Matsui T |
871 - 877 |
A circuit model simulation for separate absorption, grading, charge, and multiplication avalanche photodiodes Banoushi A, Kardan MR, Naeini MA |
878 - 883 |
The barrier height inhomogeneity in identically prepared Au/n-GaAs Schottky barrier diodes Leroy WP, Opsomer K, Forment S, Van Meirhaeghe RL |
884 - 888 |
Temperature and field dependent mobility in pentacene-based thin film transistors Zhu M, Liang GR, Cui TH, Varahramyan K |
889 - 895 |
An electron mobility model for wurtzite GaN Schwierz F |
896 - 901 |
Characteristics of 4H-SiC MOS interface annealed in N2O Fujihira K, Tarui Y, Imaizumi M, Ohtsuka K, Takami T, Shiramizu T, Kawase K, Tanimura J, Ozeki T |
902 - 906 |
Electrical properties of spray pyrolytic tin sulfide films Reddy NK, Reddy KTR |
907 - 914 |
Low-frequency noise and Coulomb scattering in Si0.8Ge0.2 surface channel pMOSFETs with ALD Al2O3 gate dielectrics von Haartman M, Westlinder J, Wu D, Malm BG, Hellstrom PE, Olsson J, Ostling M |
915 - 922 |
Experimental investigation of the kink effect and the low frequency noise properties in pseudomorphic HEMTs Principato F, Caddemi A, Ferrante G |
923 - 927 |
Electron direct tunneling time in heterostructures with nanometer-thick trapezoidal barriers Khairurrijal, Noor FA, Sukirno |
928 - 934 |
On the soft breakdown phenomenon in AlGaAs/InGaAs HEMT: An experimental study down to cryogenic temperature Caddemi A, Crupi G, Donato N |
935 - 939 |
Two relaxation mechanisms in (Sr1-1.5xBix)TiO3 (x : 0.0067) Senturk E |
940 - 944 |
Normal distribution of confinement energy from a photoluminescence line shape analysis in oxidized porous silicon Chen SY, Huang YH, Cai BN |
945 - 955 |
Design and optimization of junction termination extension (JTE) for 4H-SiC high voltage Schottky diodes Mahajan A, Skromme BJ |
956 - 964 |
Two-dimensional DC simulation methodology for InP/GaAs0.51Sb0.49/InP heterojunction bipolar transistor Maneux C, Belhaj M, Grandchamp B, Labat N, Touboul A |
965 - 975 |
A numerical study of scaling issues for trench power MOSFETs Roig J, Cortes I, Jimenez D, Flores D, Iniguez B, Hidalgo S, Rebollo J |
976 - 980 |
Modeling MOSFET surface capacitance behavior under non-equilibrium Kapoor A, Jindal RP |
981 - 985 |
High performance InP/InGaAs/InP DHBTs with patterned sub-collector fabricated by elevated temperature N plus implant Chen M, Sokolich M, Chow D, Shi B, Rajavel R, Bui S, Royter Y, Thomas S, Fields C |
986 - 990 |
The effects of mechanical planar biaxial strain in Si/SiGe HBT BiCMOS technology Haugerud BM, Nayeern MB, Krithivasan R, Lu Y, Zhu CD, Cressler JD, Belford RE, Joseph AJ |
991 - 996 |
Tunnelling enhanced recombination in polycrystalline CdS/CdTe and CdS/Cu(In,Ga)Se-2 heterojunction solar cells Bayhan H, Kavasoglu AS |
997 - 1001 |
Body factor conscious modeling of single gate fully depleted SOI MOSFETs for low power applications Kumar A, Nagumo T, Tsutsui G, Ohtou T, Hiramoto T |
1002 - 1008 |
A TCAD methodology for high-speed photodetectors Jacob B, Witzigmann B, Klemenc M, Petit C |
1009 - 1016 |
Accurate modeling and parameter extraction method for organic TFTs Estrada A, Cerdeira A, Puigdollers J, Resendiz L, Pallares J, Marsal LF, Voz C, Iniguez B |
1017 - 1028 |
Electron transport modeling in the inversion layers of 4H and 6H-SiC MOSFETs on implanted regions Zeng YA, White MH, Das MK |
1029 - 1033 |
Preparation and gas-sensing properties of NiFe2O4 semiconductor materials Yang LF, Xie YG, Zhao HY, Wu XH, Wang YD |
1034 - 1043 |
Parameter sensitivity for optimal design of 65 nm node double gate SOI transistors Lim TC, Armstrong GA |
1044 - 1048 |
Electrical properties of [100]-oriented CVD diamond film Su QF, Lu JF, Wang LJ, Liu JM, Ruan JF, Cui JT, Shi WM, Xia YB |
1049 - 1051 |
Identical resonant features of THz photoconductivity and plasmon absorption in a grid-gated double-quantum well FET Popov VV, Teperik TV, Zayko YN, Allen ST, Horing NJM |
1052 - 1054 |
Temperature dependence of barrier heights of Au/n-type GaAs Schottky diodes Karatas S, Altindal S |