화학공학소재연구정보센터

Solid-State Electronics

Solid-State Electronics, Vol.48, No.9 Entire volume, number list
ISSN: 0038-1101 (Print) 

In this Issue (34 articles)

1461 - 1461 Non volatile memories with discrete storage nodes - Foreword
De Salvo B, Lombardo S
1463 - 1473 Silicon nanocrystal based memory devices for NVM and DRAM applications
Rao RA, Steimle RF, Sadd M, Swift CT, Hradsky B, Straub S, Merchant T, Stoker M, Anderson SGH, Rossow M, Yater J, Acred B, Harber K, Prinz EJ, White BE, Muralidhar R
1475 - 1481 Engineering on tunnel barrier and dot surface in Si nanocrystal memories
Baik SJ, Choi S, Chung UI, Moon JT
1483 - 1488 Nanocrystal memories for FLASH device applications
Ammendola G, Ancarani V, Triolo V, Bileci M, Corso D, Crupi I, Perniola L, Gerardi C, Lombardo S, DeSalvo B
1489 - 1495 Spatial characterization of localized charge trapping and charge redistribution in the NROM device
Shappir A, Levy D, Shacham-Diamand Y, Lusky E, Bloom I, Eitan B
1497 - 1502 Study of nanocrystal memory reliability by CAST structures
Compagnoni CM, Ielmini D, Spinelli AS, Lacaita AL, Gerardi C
1503 - 1509 Growth and characterization of LPCVD Si quantum dots on insulators
Baron T, Mazen F, Hartmann JM, Mur P, Puglisi RA, Lombardo S, Ammendola G, Gerardi C
1511 - 1517 Silicon nanocrystal memory devices obtained by ultra-low-energy ion-beam synthesis
Dimitrakis P, Kapetanakis E, Tsoukalas D, Skarlatos D, Bonafos C, Ben Asssayag G, Claverie A, Perego M, Fanciulli M, Soncini V, Sotgiu R, Agarwal A, Ameen M, Sohl C, Normand P
1519 - 1524 Development of silicon nitride dots for nanocrystal memory cells
Wan YM, Buffet N, van der Jeugd K, Mur P, Mariolle D, Nicotra G, Lombardo S
1525 - 1530 Characterization of the spatial charge distribution in local charge-trapping memory devices using the charge-pumping technique
Rosmeulen M, Breuil L, Lorenzini M, Haspeslag L, Van Houdt J, De Meyer K
1531 - 1537 Characteristics of bonds produced by full ceramic and composite ultrasonic transducers
Xu CH, Chan HLW, Ng WY, Cheung KYM, Liu PCK
1539 - 1548 Derivation of Shockley-Read-Hall recombination rates in bulk and PD-SOI MOSFET's channels valid in all modes of operation
Sallese JM, Krummenacher F, Fazan P
1549 - 1553 Surface treatment for enhancing current gain of AlGaAs/GaAs heterojunction bipolar transistor
Oh TK, Baek CH, Kang BK
1555 - 1562 Theoretical limit estimation of lateral wide band-gap semiconductor power-switching device
Saito W, Omura I, Ogura T, Ohashi H
1563 - 1568 Electrical properties of thermally stable Pt/Re/Au ohmic contacts to p-type GaN
Reddy VR, Kim SH, Song JO, Seong TY
1569 - 1577 Silicon carbide TUNNETT diodes
Buniatyan VV, Aroutiounian VM, Zekentes K, Camara N, Soukiassian P
1579 - 1586 Investigation of defect properties in Cu(In,Ga)Se-2 solar cells by deep-level transient spectroscopy
Kerr LL, Li SS, Johnston SW, Anderson TJ, Crisalle OD, Kim WK, Abushama J, Noufi RN
1587 - 1595 High-voltage planar Si detectors for high-energy physics experiments: comparison between metal-overhang and field-limiting ring techniques
Ranjan K, Bhardwaj A, Namrata, Chatterji S, Srivastava AK, Jha MK, Kumar A, Shivpuri RK
1597 - 1600 GaN-based light-emitting diodes with Ni-Mg solid solution/Au p-type ohmic contact
Song JO, Leem DS, Kim SH, Kwak JS, Nam OH, Park Y, Seong TY
1601 - 1606 Prediction study of elastic properties under pressure effect for zincblende BN, AlN, GaN and InN
Kanoun MB, Merad AE, Merad G, Cibert J, Aourag H
1607 - 1612 Comparison of raised source/drain versus raised extension in ultra-thin body, fully-depleted-SOI, including effects of BEOL via capacitances
Egley JL, Vandooren A, Winstead B, Verret E, Workman C, White B, Nguyen BY
1613 - 1622 A unified analytical model for charge transport in Heterojunction Bipolar Transistors
Reddy KV, DasGupta A
1623 - 1627 The role of surface adsorbates on electrical properties of MOVPE grown HgCdTe onto (001) GaAs substrates
Kim JS, Kim YH, Kim BK, Je HJ
1629 - 1635 Effects of a trench under the gate in high voltage RESURF LDMOSFET for SOI power integrated circuits
Son WS, Sohn YH, Choi SY
1637 - 1641 Current gain increase by SiNx passivation in self-aligned InGaAs/InP heterostructure bipolar transistor with compositionally graded base
Jin Z, Otten F, Reimann T, Neumann S, Prost W, Tegude FJ
1643 - 1650 Characterization of symmetrical spiral inductor in 0.35 mu m CMOS technology for RF application
Teo TH, Choi YB, Liao HL, Xiong YZ, Fu JS
1651 - 1654 1.3 mu m compressive-strain GaInAsP/GaInAsP multiple- quantum-well laser diodes with a tensile-strain GaInP electron stopper layer
Wu MY, Tsai CL, Wu MC, Lei PH, Ho CL, Ho WJ
1655 - 1660 Realizing high breakdown voltages (> 600 V) in partial SOI technology
Tadikonda R, Hardikar S, Narayanan EMS
1661 - 1666 Quantum mechanical effect in temperature dependence of threshold voltage of extremely thin SOI MOSFETs
Omura Y, Nakakubo A, Nakatsuji H
1667 - 1672 An improved In-based ohmic contact to n-GaSb
Robinson JA, Mohney SE
1673 - 1677 Determination of optimal insulator thickness for MISiC hydrogen sensors
Xu JP, Lai PT, Han B, Tang WM
1679 - 1681 Photoelectromagnetic detector on the basis of CdxHg1-xTe
Gaziyev FN, Huseynov EK
1683 - 1686 Fabrication of GaAs Schottky diode by liquid phase chemical enhanced oxidation
Wang CC, Huang HK, Wang YH, Houng MP, Wu CL, Chang CS
1687 - 1690 Characteristics of low-energy nitrogen ion-implanted oxide and NO-annealed gate dielectrics
Lee SC, Simoen E, Badenes G