1817 - 1824 |
Effects of surface oxides on field emission from silicon Shaw J |
1825 - 1832 |
Studies on the interaction between thin film materials and Mo field emitter arrays Chalamala BR, Reuss RH |
1833 - 1839 |
Emission sensitivity to tip position of Spindt-type field emitters Xie CG, Wei Y, Lucero R, Woodburn R |
1840 - 1846 |
Electron field emission from amorphous carbon nitride synthesized by electron cyclotron resonance plasma Liu XW, Tsai SH, Lee LH, Yang MX, Yang ACM, Lin IN, Shih HC |
1847 - 1852 |
Self-assembled gold silicide wires on bromine-passivated Si(110) surfaces Rout B, Sundaravel B, Das AK, Ghose SK, Sekar K, Mahapatra DP, Dev BN |
1853 - 1857 |
Mechanism of laser-induced nanomodification on hydrogen-passivated Si(100) surfaces underneath the tip of a scanning tunneling microscope Mai ZH, Lu YF, Huang SM, Chim WK, Pan JS |
1858 - 1860 |
Enhancement of resolution of DNA on silylated mica using atomic force microscopy Tang J, Li JW, Wang C, Bai CL |
1861 - 1865 |
New polymer materials for nanoimprinting Schulz H, Scheer HC, Hoffmann T, Torres CMS, Pfeiffer K, Bleidiessel G, Grutzner G, Cardinaud C, Gaboriau F, Peignon MC, Ahopelto J, Heidari B |
1866 - 1873 |
Bilayer, nanoimprint lithography Faircloth B, Rohrs H, Tiberio R, Ruoff R, Krchnavek RR |
1874 - 1885 |
Determination of coupled acid catalysis-diffusion processes in a positive-tone chemically amplified photoresist Houle FA, Hinsberg WD, Morrison M, Sanchez MI, Wallraff G, Larson C, Hoffnagle J |
1886 - 1889 |
Statistical considerations of the overlay error in laser driven point source x-ray lithography Tiszauer DH |
1890 - 1896 |
Comparison of Cl-2 and F-based dry etching for high aspect ratio Si microstructures etched with an inductively coupled plasma source Tian WC, Weigold JW, Pang SW |
1897 - 1902 |
Control of surface reactions in high-performance SiO2 etching Tatsumi T, Matsui M, Okigawa M, Sekine M |
1903 - 1905 |
Electron cyclotron resonance plasma etching of InP through-wafer connections at > 4 mu m/min using Cl-2/Ar Chen YW, Ooi BS, Ng GI, Tan CL |
1906 - 1910 |
Patterning of tantalum pentoxide, a high epsilon material, by inductively coupled plasma etching Jonsson LB, Westlinder J, Engelmark F, Hedlund C, Du J, Smith U, Blom HO |
1911 - 1914 |
Anisotropic etching of RuO2 and Ru with high aspect ratio for gigabit dynamic random access memory Yunogami T, Nojiri K |
1915 - 1918 |
Transmission electron microscope investigation of SrBi2Ta2O9 memory capacitors on Si with silicon dioxide and silicon nitride as buffers Ils A, Cantoni M, Sallese JM, Fazan P, Han JP, Guo X, Ma TP |
1919 - 1922 |
Stability and chemical composition of thermally grown iridium-oxide thin films Chalamala BR, Wei Y, Reuss RH, Aggarwal S, Perusse SR, Gnade BE, Ramesh R |
1923 - 1928 |
Effects of (Ba, Sr)TiO3 film thickness on electrical properties of (Ba, Sr)TiO3/(Ba, Sr)RuO3 capacitor Oh SH, Park KW, Park JH, Kim BS, Choi DK |
1929 - 1936 |
Effects of composition and N-2 plasma treatment on the barrier effectiveness of chemically vapor deposited WSix films Wang MT, Chuang MH, Chen LJ, Chen MC |
1937 - 1941 |
Study of forming a p(+) poly-Si gate by inductively coupled nitrogen plasma nitridation of the stacked poly-Si layers Juang MH |
1942 - 1948 |
Ion-bombardment effects on PtSi/n-Si Schottky contacts studied by ballistic electron emission microscopy Ru GP, Qu XP, Zhu SY, Li BZ, Detavernier C, Van Meirhaeghe RL, Cardon F, Donaton RA, Maex K |
1949 - 1952 |
Effect of ramp rate on the C49 to C54 titanium disilicide phase transformation from Ti and Ti(Ta) Smith PM, Bailey G, Hu YZ, Tay SP |
1953 - 1956 |
Mosaic structure of various oriented grains in CoSi2/Si(001) Kang TS, Je JH, Kim GB, Baik HK, Lee SM |
1957 - 1961 |
Effect of the first antimony layer on AuZn ohmic contacts to p-type InP Yamaguchi A, Asamizu H, Okada T, Iguchi Y, Saitoh T, Koide Y, Murakami M |
1962 - 1966 |
Design and implementation of optoelectronic interfaces for high-speed burst-mode transmissions Bende AB |
1967 - 1972 |
Electroreflectance and photoreflectance studies of surface Fermi level and surface state densities of InPSIN+ structures Hwang WC, Cheng YJ, Wang YC, Hwang JS |
1973 - 1979 |
Passivation of the Ge/InP(110) interface by As interlayers: Interface reactions and band offsets Preobrajenski AB, Schomann S, Gebhardt RK, Chasse T |
1980 - 1990 |
Polarized laser light scattering applied to surface morphology characterization of epitaxial III-V semiconductor layers Gonzalez MU, Sanchez-Gil JA, Gonzalez Y, Gonzalez L, Mendez ER |
1991 - 1996 |
Reduction of indium segregation in InGaAs/GaAs quantum wells grown by molecular beam epitaxy on vicinal GaAs(001) substrates Martini S, Quivy AA, Tabata A, Leite JR |
1997 - 2000 |
Structural and electrical properties of chemical vapor deposited diamond films doped by B+ implantation Wang SB, Zhang HX, Zhu P, Feng K |
2001 - 2004 |
Preparation of C-60-doped silica aerogels and the study of photoluminescence properties Zhou B, Wang J, Zhao L, Shen J, Deng ZS, Li YF |
2005 - 2007 |
Chlorination of Si surfaces under strain conditions Halicioglu T |
2008 - 2010 |
Stability of boron and phosphorus implanted tungsten silicide structures at high temperatures Bashir R, Hebert F |
2011 - 2015 |
Low temperature inorganic chemical vapor deposition of Ti-Si-N diffusion barrier liners for gigascale copper interconnect applications Eisenbraun E, Upham A, Dash R, Zeng WX, Hoefnagels J, Lane S, Anjum D, Dovidenko K, Kaloyeros A, Arkles B, Sullivan JJ |
2016 - 2020 |
Plasma-enhanced atomic layer deposition of Ta and Ti for interconnect diffusion barriers Rossnagel SM, Sherman A, Turner F |
2021 - 2023 |
Observation of fine structures of nanodomains in donor-modified Pb(Zr,Ti)O-3 ferroelectrics Tan Q, Li JX |
2024 - 2026 |
Sheet resistance nonuniformity for ionized titanium deposition Ross KA, Thimm P |
2027 - 2029 |
Time-stability measurement and compensation of a scanning probe microscope instrument Huang WH, Wang WW, Xia AD, Jin N, Hu ZQ |
2030 - 2030 |
Ion-etch produced damage on InAs(100) studied through collective-mode electronic Raman scattering (vol 18, pg 144, 2000) Tanzer TA, Bohn PW, Roshchin IV, Greene LH |
2033 - 2033 |
Papers from the 27th Conference on the Physics and Chemistry of Semiconductor Interfaces - 16-20 January 2000 Salt Lake City, Utah - Preface Rowe JE, Palmstrom CJ |
2034 - 2038 |
Scanning capacitance microscopy imaging of silicon metal-oxide-semiconductor field effect transistors Kleiman RN, O'Malley ML, Baumann FH, Garno JP, Timp GL |
2039 - 2043 |
Ferromagnetic III-V heterostructures Ohno H |
2044 - 2046 |
Nickel layers on indium arsenide Hill CJ, Beach RA, McGill TC |
2047 - 2051 |
Interfacial scattering of hot electrons in ultrathin Au/Co films Lu RP, Morgan BA, Kavanagh KL, Powell CJ, Chen PJ, Serpa FG, Egelhoff WF |
2052 - 2056 |
Ferromagnetic MnAs grown on GaAs(001): In situ investigations Kastner M, Schippan F, Schutzendube P, Daweritz L, Ploog K |
2057 - 2062 |
Epitaxial ferromagnetic metal/GaAs(100) heterostructures Chen LC, Dong JW, Schultz BD, Palmstrom CJ, Berezovsky J, Isakovic A, Crowell PA, Tabat N |
2063 - 2065 |
Enhanced magneto-optical effect in a GaAs : MnAs nanoscale hybrid structure combined with GaAs/AlAs distributed Bragg reflectors Shimizu H, Miyamura M, Tanaka M |
2066 - 2071 |
Strain relaxation of InGaAs by lateral oxidation of AlAs Mathis SK, Chavarkar P, Andrews AM, Mishra UK, Speck JS |
2072 - 2076 |
Scanning tunneling microscopy study of organometallic molecules adsorbed on a GaAs(001)-2X4 surface Kuramochi H, Cui J, Iwai H, Ozeki M |
2077 - 2081 |
Reflectance anisotropy spectroscopy of the growth of perylene-3,4,9,10-tetracarboxylic dianhydride on chalcogen passivated GaAs(001) surfaces Kampen TU, Rossow U, Schumann M, Park S, Zahn DRT |
2082 - 2087 |
Schottky barrier height and electron affinity of titanium on AIN Ward BL, Hartman JD, Hurt EH, Tracy KM, Davis RF, Nemanich RJ |
2088 - 2095 |
Quantitative theory of scattering in antimonide-based heterostructures with imperfect interfaces Shaw MJ, Corbin EA, Kitchin MR, Hagon JP, Jaros M |
2096 - 2099 |
Interface control and band offset at the Ga0.52In0.48P an GaAs heterojunction Cai C, Nathan MI |
2100 - 2108 |
Effects of gap states an scanning tunneling spectra observed on (110)- and (001)-oriented clean surfaces and ultrathin Si layer covered surfaces of GaAs prepared by molecular beam epitaxy Hasegawa H, Negoro N, Kasai S, Ishikawa Y, Fujikuwa H |
2109 - 2113 |
Spin-dependent resonant tunneling in double-barrier magnetic heterostructures Petukhov AG, Demchenko DO, Chantis AN |
2114 - 2118 |
Schottky barrier tuning with heterovalent interlayers: Al/Ge/GaAs versus Al/Si/GaAs Berthod C, Binggeli N, Baldereschi A |
2119 - 2127 |
Tunable Schottky barrier contacts to InxGa1-xAs Marinelli C, Sorba L, Lazzarino M, Kumar D, Pelucchi E, Muller BH, Orani D, Rubini S, Franciosi A, De Franceshi S, Beltran F |
2128 - 2138 |
Photoemission results on intralayer insertion at III-V/III-V junctions: A critical appraisal of the different interpretations Moreno M, Alonso M, Horicke M, Hey R, Horn K, Sacedon JL, Ploog KH |
2139 - 2145 |
Epitaxial oxide thin films on Si(001) Yu Z, Ramdani J, Curless JA, Overgaard CD, Finder JM, Droopad R, Eisenbeiser KW, Hallmark JA, Ooms WJ, Kaushik VS |
2146 - 2152 |
Epitaxial thin films of MgO an Si using metalorganic molecular beam epitaxy Niu F, Hoerman BH, Wessels BW |
2153 - 2159 |
Hot carrier transport effects in Al2O3-based metal-oxide-semiconductor structures Ludeke R, Cuberes MT, Cartier E |
2160 - 2164 |
Mechanism of dopant segregation to SiO2/Si(001) interfaces Dabrowski J, Casali RA, Mussig HJ, Baierle R, Caldas MJ, Zavodinsky V |
2165 - 2168 |
Roughening of the Si/SiO2 interface during SC1-chemical treatment studied by scanning tunneling microscopy Gotoh M, Sudoh K, Iwasaki H |
2169 - 2173 |
E' centers and leakage currents in the gate oxides of metal oxide silicon devices Lenahan PM, Mele JJ |
2174 - 2178 |
Photoemission spectroscopy of platinum overlayers on silicon dioxide films Keister JW, Rowe JE, Kolodziej JJ, Madey TE |
2179 - 2186 |
Intrinsic limitations on ultimate device performance and reliability at (i) semiconductor-dielectric interfaces and (ii) internal interfaces in stacked dielectrics Lucovsky G, Yang H, Niimi H, Thorpe MF, Phillips JC |
2187 - 2192 |
Strain-induced self-organized growth of nanostructures: From step bunching to ordering in quantum dot superlattices Stangl J, Roch T, Holy V, Pinczolits M, Springholz G, Bauer G, Kegel I, Metzger TH, Zhu J, Brunner K, Abstreiter G, Smilgies D |
2193 - 2196 |
Controlled ordering and positioning of InAs self-assembled quantum dots Lee H, Johnson JA, Speck JS, Petroff PM |
2197 - 2203 |
Growth and microstructure of self-assembled ErAs islands in GaAs Kadow C, Johnson JA, Kolstad K, Ibbetson JP, Gossard AC |
2204 - 2209 |
Evolution of Si-on-GaAs (001) surface morphology towards self-organized ordered Si structures Wang ZM, Daweritz T, Schutzendube P, Ploog KH |
2210 - 2214 |
Atomic structure and composition of the (2X4) reconstruction of InGaP(001) Vogt P, Ludge K, Zorn M, Pristovsek M, Braun W, Richter W, Esser N |
2215 - 2223 |
Understanding reflectance anisotropy: Surface-state signatures and bulk-related features Schmidt WG, Bechstedt F, Bernholc J |
2224 - 2228 |
In situ reflectance-difference spectroscopy of doped CdTe and ZnTe grown by molecular beam epitaxy Balderas-Navarro RE, Hingerl K, Hilber W, Stifter D, Bonanni A, Sitter H |
2229 - 2231 |
Surface-induced optical anisotropy of Si and Ge Rossow U, Mantese L, Aspnes DE |
2232 - 2241 |
In-plane optical anisotropy of quantum well structures: From fundamental considerations to interface characterization and optoelectronic engineering Cortez S, Krebs O, Voisin P |
2242 - 2254 |
Optical properties of bulk and thin-film SrTiO3 on Si and Pt Zollner S, Demkov AA, Liu R, Fejes PL, Gregory RB, Alluri P, Curless JA, Yu Z, Ramdani J, Droopad R, Tiwald TE, Hilfiker JN, Woollam JA |
2255 - 2262 |
Method for atomic-layer-resolved measurement of polarization fields by nuclear magnetic resonance Kempf JG, Weitekamp DP |
2263 - 2270 |
ZnSe/CdTe/ZnSe heterostructures Rubini S, Bonanni B, Pelucchi E, Franciosi A, Garulli A, Parisini A, Zhuang Y, Bauer G, Holy V |
2271 - 2273 |
Anisotropic strain in (100) ZnSe epilayers grown on lattice mismatched substrates Yang Z, Sou IK, Chen YH |
2274 - 2278 |
GaInAsP grown on GaAs substrate by solid source molecular beam epitaxy with a valve phosphorous cracker cell Zhang DH, Wang XZ, Zheng HQ, Shi W, Yoon SF, Kam CH |
2279 - 2283 |
Interface tuning of the InAs/AlSb heterostructure-based quantum wells Ichizli VM, Mutamba K, Droba M, Sigurdardottir A, Hartnagel HL |
2284 - 2289 |
Surface structures and growth kinetics of InGaN(0001) grown by molecular beam epitaxy Chen HJ, Feenstra RM, Northrup JE, Zywietz T, Neugebauer J, Greve DW |
2290 - 2294 |
Growth of high-quality (Al,Ga)N and (Ga,In)N heterostructures on SiC(0001) by both plasma-assisted and reactive molecular beam epitaxy Ploog KH, Brandt O, Muralidharan R, Thamm A, Waltereit P |
2295 - 2299 |
Point defect modification in wide band gap semiconductors through interaction with high-energy electrons: Is reflection high-energy electron diffraction truly benign? Myers TH, Ptak AJ, VanMil BL, Moldovan M, Treado PJ, Nelson MP, Ribar JM, Zugates CT |
2300 - 2303 |
X-ray studies of group III-nitride quantum wells with high quality interfaces Fewster PF, Andrew NL, Hughes OH, Staddon C, Foxon CT, Bell A, Cheng TS, Wang T, Sakai S, Jacobs K, Moerman I |
2304 - 2308 |
Charging effects in AlGaN/GaN heterostructures probed using scanning capacitance microscopy Smith KV, Dang XZ, Yu ET, Redwing JM |
2309 - 2312 |
Depth-resolved spectroscopy of interface defects in AlGaN/GaN heterostructure field effect transistors device structures Young AP, Bae J, Brillson LJ, Murphy MJ, Schaff WJ |
2313 - 2321 |
ZnO/GaN heterointerfaces and ZnO films grown by plasma-assisted molecular beam epitaxy on (0001) GaN/Al2O3 Hong SK, Ko HJ, Chen Y, Hanada T, Yao T |
2322 - 2327 |
Polarization effects and transport in AlGaN/GaN system Zhang YF, Smorchkova Y, Elsass C, Keller S, Ibbetson J, DenBaars S, Mishra U, Singh J |