화학공학소재연구정보센터

Plasma Chemistry and Plasma Processing

Plasma Chemistry and Plasma Processing, Vol.34, No.2 Entire volume, number list
ISSN: 0272-4324 (Print) 

In this Issue (8 articles)

239 - 257 On the LPCVD-Formed SiO2 Etching Mechanism in CF4/Ar/O-2 Inductively Coupled Plasmas: Effects of Gas Mixing Ratios and Gas Pressure
Son J, Efremov A, Chun I, Yeom GY, Kwon KH
259 - 269 Plasma Polymerization Inside Tubes in Hexamethyldisiloxanes and Ethyne Glow Discharges: Effects of Deposition Atmosphere on Wetting and Ageing in Solvents
Lackner JM, Wiesinger M, Kaindl R, Waldhauser W, Heim D, Hartmann P
271 - 285 Characterization of Plasma Polymerized Hexamethyldisiloxane Films Prepared by Arc Discharge
Lazauskas A, Baltrusaitis J, Grigaliunas V, Jucius D, Guobiene A, Prosycevas I, Narmontas P
287 - 300 Non Thermal Plasma Functionalized 2D Carbon-Carbon Composites as Supports for Co Nanoparticles
Souquet-Grumey J, Ayrault P, Heintz O, Barrault J, Tatibouet JM, Plaisantin H, Thebault J, Valange S, Fourre E
301 - 311 Atmospheric-Pressure Cold Plasma for Preparation of High Performance Pt/TiO2 Photocatalyst and Its Mechanism
Di LB, Zhang XL, Xu ZJ, Wang K
313 - 326 Chemical Kinetics of Methane Pyrolysis in Microwave Plasma at Atmospheric Pressure
Dors M, Nowakowska H, Jasinski M, Mizeraczyk J
327 - 341 Study of Microwave Torch Plasmachemical Synthesis of Iron Oxide Nanoparticles Focused on the Analysis of Phase Composition
Synek P, Jasek O, Zajickova L
343 - 359 A Simplified Global Model to Describe the Oxidation of Acetylene Under Nanosecond Pulsed Discharges in a Complex Corona Reactor
Redolfi M, Touchard S, Duten X, Hassouni K