239 - 257 |
On the LPCVD-Formed SiO2 Etching Mechanism in CF4/Ar/O-2 Inductively Coupled Plasmas: Effects of Gas Mixing Ratios and Gas Pressure Son J, Efremov A, Chun I, Yeom GY, Kwon KH |
259 - 269 |
Plasma Polymerization Inside Tubes in Hexamethyldisiloxanes and Ethyne Glow Discharges: Effects of Deposition Atmosphere on Wetting and Ageing in Solvents Lackner JM, Wiesinger M, Kaindl R, Waldhauser W, Heim D, Hartmann P |
271 - 285 |
Characterization of Plasma Polymerized Hexamethyldisiloxane Films Prepared by Arc Discharge Lazauskas A, Baltrusaitis J, Grigaliunas V, Jucius D, Guobiene A, Prosycevas I, Narmontas P |
287 - 300 |
Non Thermal Plasma Functionalized 2D Carbon-Carbon Composites as Supports for Co Nanoparticles Souquet-Grumey J, Ayrault P, Heintz O, Barrault J, Tatibouet JM, Plaisantin H, Thebault J, Valange S, Fourre E |
301 - 311 |
Atmospheric-Pressure Cold Plasma for Preparation of High Performance Pt/TiO2 Photocatalyst and Its Mechanism Di LB, Zhang XL, Xu ZJ, Wang K |
313 - 326 |
Chemical Kinetics of Methane Pyrolysis in Microwave Plasma at Atmospheric Pressure Dors M, Nowakowska H, Jasinski M, Mizeraczyk J |
327 - 341 |
Study of Microwave Torch Plasmachemical Synthesis of Iron Oxide Nanoparticles Focused on the Analysis of Phase Composition Synek P, Jasek O, Zajickova L |
343 - 359 |
A Simplified Global Model to Describe the Oxidation of Acetylene Under Nanosecond Pulsed Discharges in a Complex Corona Reactor Redolfi M, Touchard S, Duten X, Hassouni K |