화학공학소재연구정보센터

Plasma Chemistry and Plasma Processing

Plasma Chemistry and Plasma Processing, Vol.35, No.6 Entire volume, number list
ISSN: 0272-4324 (Print) 

In this Issue (13 articles)

925 - 962 Microplasma: A New Generation of Technology for Functional Nanomaterial Synthesis
Lin LL, Wang Q
963 - 978 Deposition of Ni Coatings by Electrolytic Plasma Processing
Smith A, Kelton R, Meletis EI
979 - 991 Nitrogen Atmospheric-Pressure-Plasma-Jet Induced Oxidation of SnOx Thin Films
Lin GW, Jiang YH, Kao PK, Chiu IC, Wu YH, Hsu CC, Cheng IC, Chen JZ
993 - 1014 Spectroscopic Characterization of Argon-Nitrogen Surface-Wave Discharges in Dielectric Tubes at Atmospheric Pressure
Bravo JA, Rincon R, Munoz J, Sanchez A, Calzada MD
1015 - 1028 Atmospheric Pressure Plasma Polymerization of Super-Hydrophobic Nano-films Using Hexamethyldisilazane Monomer
Huang C, Lin HH, Li C
1029 - 1042 Experimental Study of the Transient Response of Bunsen Flame to Nanosecond Pulsed Discharges
Zhang SH, Yu XL, Xiong H, Zeng H, Li F
1043 - 1056 Generation of In-Package Cold Plasma and Efficacy Assessment Using Methylene Blue
Misra NN, Keener KM, Bourke P, Cullen PJ
1057 - 1070 On the Gas Heating Mechanism for the Fast Anode Arc Reattachment in a Non-transferred Arc Plasma Torch Operating with Nitrogen Gas in the Restrike Mode
Prevosto L, Kelly H, Mancinelli B, Chamorro JC
1071 - 1095 Properties of Argon-Nitrogen Atmospheric Pressure DC Arc Plasma
Rankovic D, Kuzmanovic M, Pavlovic MS, Stoiljkovic M, Savovic J
1097 - 1110 On the Selection of Integration Intervals for the Calculation of Mean Absorption Coefficients
Kloc P, Aubrecht V, Bartlova M, Coufal O, Rumpler C
1111 - 1118 Hydrogen Reduction of Germanium Tetrafluoride in RF-Discharge
Kornev RA, Sennikov PG
1119 - 1127 Pressure-Dependent Etching Mechanism and Induced Dielectric Properties Variation of BZN Thin Films in SF6/Ar Plasma
Dai LP, Song WP, Wang SY, Zhong ZQ, Zhang GJ
1129 - 1142 A Model-Based Comparative Study of HCl and HBr Plasma Chemistries for Dry Etching Purposes
Efremov A, Kim JH, Kwon KH